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Micromachines 2017, 8(5), 148;

RF Sputtering, Post-Annealing Treatment and Characterizations of ZnO (002) Thin Films on 3C-SiC (111)/Si (111) Substrates

Queensland Micro- and Nanotechnology Centre, Griffith University, Nathan 4111, Australia
These authors contributed equally to this work.
Author to whom correspondence should be addressed.
Academic Editor: Ha Duong Ngo
Received: 20 February 2017 / Revised: 26 April 2017 / Accepted: 28 April 2017 / Published: 7 May 2017
(This article belongs to the Special Issue SiC-Based Microsystems)
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We report on the radio frequency (RF) sputtering of c-axis oriented ZnO thin films on top of epitaxial 3C-SiC-on-Si (111) substrates, which were then subjected to post-annealing treatment at 400, 600 and 800 °C. Grazing incident X-ray Diffraction (XRD) data show that the Full Width Half Maximum (FWHM) values for O2/Ar ratios between 30% and 60% are consistent, with a mean of 0.325° and a standard deviation of 0.03°. This is largely attributed to the smaller lattice mismatch of 5% between the ZnO (002) and SiC (111) films. The quality of the ZnO films deteriorated at the post-annealing treatment of 800 °C, as demonstrated by the increasing value of FWHM diffraction peaks, the reducing value of the peak intensity, the reducing percentage of (002) oriented area under the curve, and the increasing value of biaxial stress. We propose a simple growth model to explain the result. View Full-Text
Keywords: ZnO; silicon carbide; radio frequency (RF) sputtering; annealing ZnO; silicon carbide; radio frequency (RF) sputtering; annealing

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Valliyil Sasi, V.; Iqbal, A.; Chaik, K.; Iacopi, A.; Mohd-Yasin, F. RF Sputtering, Post-Annealing Treatment and Characterizations of ZnO (002) Thin Films on 3C-SiC (111)/Si (111) Substrates. Micromachines 2017, 8, 148.

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