Next Article in Journal
Acknowledgement to Reviewers of Micromachines in 2016
Next Article in Special Issue
Scalable Nanomanufacturing—A Review
Previous Article in Journal
Rapid Fabrication of Electrophoretic Microfluidic Devices from Polyester, Adhesives and Gold Leaf
Previous Article in Special Issue
Time-Efficient High-Resolution Large-Area Nano-Patterning of Silicon Dioxide
Article Menu
Issue 1 (January) cover image

Export Article

Open AccessArticle
Micromachines 2017, 8(1), 18; doi:10.3390/mi8010018

Solvent-Free Patterning of Colloidal Quantum Dot Films Utilizing Shape Memory Polymers

1
Department of Mechanical Science and Engineering, University of Illinois at Urbana–Champaign, Urbana, IL 61801, USA
2
Department of Material Science and Engineering, University of Illinois at Urbana–Champaign, Urbana, IL 61801, USA
These authors contributed equally to this work.
*
Author to whom correspondence should be addressed.
Academic Editors: Chang-Hwan Choi and Ishan Wathuthanthri
Received: 14 November 2016 / Revised: 27 December 2016 / Accepted: 5 January 2017 / Published: 10 January 2017
(This article belongs to the Special Issue Scalable Micro/Nano Patterning)
View Full-Text   |   Download PDF [2000 KB, uploaded 10 January 2017]   |  

Abstract

Colloidal quantum dots (QDs) with properties that can be tuned by size, shape, and composition are promising for the next generation of photonic and electronic devices. However, utilization of these materials in such devices is hindered by the limited compatibility of established semiconductor processing techniques. In this context, patterning of QD films formed from colloidal solutions is a critical challenge and alternative methods are currently being developed for the broader adoption of colloidal QDs in functional devices. Here, we present a solvent-free approach to patterning QD films by utilizing a shape memory polymer (SMP). The high pull-off force of the SMP below glass transition temperature (Tg) in conjunction with the conformal contact at elevated temperatures (above Tg) enables large-area, rate-independent, fine patterning while preserving desired properties of QDs. View Full-Text
Keywords: colloidal quantum dots; shape memory polymer; patterning colloidal quantum dots; shape memory polymer; patterning
Figures

Figure 1

This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited. (CC BY 4.0).

Scifeed alert for new publications

Never miss any articles matching your research from any publisher
  • Get alerts for new papers matching your research
  • Find out the new papers from selected authors
  • Updated daily for 49'000+ journals and 6000+ publishers
  • Define your Scifeed now

SciFeed Share & Cite This Article

MDPI and ACS Style

Keum, H.; Jiang, Y.; Park, J.K.; Flanagan, J.C.; Shim, M.; Kim, S. Solvent-Free Patterning of Colloidal Quantum Dot Films Utilizing Shape Memory Polymers. Micromachines 2017, 8, 18.

Show more citation formats Show less citations formats

Note that from the first issue of 2016, MDPI journals use article numbers instead of page numbers. See further details here.

Related Articles

Article Metrics

Article Access Statistics

1

Comments

[Return to top]
Micromachines EISSN 2072-666X Published by MDPI AG, Basel, Switzerland RSS E-Mail Table of Contents Alert
Back to Top