Micromachines 2013, 4(2), 232-242; doi:10.3390/mi4020232
Article

Fabrication of Nanopillar Micropatterns by Hybrid Mask Lithography for Surface-Directed Liquid Flow

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Received: 19 March 2013; in revised form: 12 May 2013 / Accepted: 23 May 2013 / Published: 5 June 2013
This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
Abstract: This paper presents a novel method for fabricating nanopillar micropatterns for surface-directed liquid flows. It employs hybrid mask lithography, which uses a mask consisting of a combination of a photoresist and nanoparticles in the photolithography process. The nanopillar density is controlled by varying the weight ratio of nanoparticles in the composite mask. Hybrid mask lithography was used to fabricate a surface-directed liquid flow. The effect of the surface-directed liquid flow, which was formed by the air-liquid interface due to nanopillar micropatterns, was evaluated, and the results show that the oscillation of microparticles, when the micro-tool was actuated, was dramatically reduced by using a surface-directed liquid flow. Moreover, the target particle was manipulated individually without non-oscillating ambient particles.
Keywords: nanopillar; lithography; microrobot; surface-directed liquid flow; microfluidic chip
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MDPI and ACS Style

Sakuma, S.; Sugita, M.; Arai, F. Fabrication of Nanopillar Micropatterns by Hybrid Mask Lithography for Surface-Directed Liquid Flow. Micromachines 2013, 4, 232-242.

AMA Style

Sakuma S, Sugita M, Arai F. Fabrication of Nanopillar Micropatterns by Hybrid Mask Lithography for Surface-Directed Liquid Flow. Micromachines. 2013; 4(2):232-242.

Chicago/Turabian Style

Sakuma, Shinya; Sugita, Masakuni; Arai, Fumihito. 2013. "Fabrication of Nanopillar Micropatterns by Hybrid Mask Lithography for Surface-Directed Liquid Flow." Micromachines 4, no. 2: 232-242.

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