Journal: Materials, 2012
Article: A Study of Trimethylsilane (3MS) and Tetramethylsilane (4MS) Based α-SiCN:H/α-SiCO:H Diffusion Barrier Films
Chen, S.-W.; Wang, Y.-S.; Hu, S.-Y.; Lee, W.-H.; Chi, C.-C.; Wang, Y.-L.
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