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Sensors 2006, 6(4), 361-369; doi:10.3390/S6040361

“Microstructured Nanostructures” – Nanostructuring by Means of Conventional Photolithography and Layer-expansion Technique

1
Aachen University of Applied Sciences, Jülich Campus, Laboratory for Chemical Sensors and Biosensors, Ginsterweg 1, 52428 Jülich, Germany
2
Institute of Thin Films and Interfaces (ISG-2), Research Centre Jülich GmbH, 52425 Jülich, Germany
*
Author to whom correspondence should be addressed.
Received: 28 August 2005 / Accepted: 7 January 2006 / Published: 4 April 2006
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Abstract

A new and simple method for nanostructuring using conventionalphotolithography and layer expansion or pattern-size reduction technique is presented, whichcan further be applied for the fabrication of different nanostructures and nano-devices. Themethod is based on the conversion of a photolithographically patterned metal layer to ametal-oxide mask with improved pattern-size resolution using thermal oxidation. With thistechnique, the pattern size can be scaled down to several nanometer dimensions. Theproposed method is experimentally demonstrated by preparing nanostructures with differentconfigurations and layouts, like circles, rectangles, trapezoids, “fluidic-channel”-,“cantilever”- and meander-type structures. View Full-Text
Keywords: Nanostructuring; layer expansion; pattern-size reduction; self-aligned patterning. Nanostructuring; layer expansion; pattern-size reduction; self-aligned patterning.
This is an open access article distributed under the Creative Commons Attribution License (CC BY 3.0).

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MDPI and ACS Style

Platen, J.; Poghossian, A.; Schöning, M.J. “Microstructured Nanostructures” – Nanostructuring by Means of Conventional Photolithography and Layer-expansion Technique. Sensors 2006, 6, 361-369.

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