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Sensors 2017, 17(2), 278; doi:10.3390/s17020278

Performance Characterization of an xy-Stage Applied to Micrometric Laser Direct Writing Lithography

1
Grupo de Investigación Electromagnetismo Aplicado, línea Microingeniería, Universidad EAFIT, Medellín 050022, Colombia
2
Grupo de Investigación en Automática, Electrónica y Ciencias Computacionales, Línea Sistemas de Control y Robótica, Instituto Tecnológico Metropolitano, ITM, Medellín 050013, Colombia
3
Grupo de Investigación en Materiales Avanzados y Energía MatyEr, Línea Biomateriales y Electromedicina, Instituto Tecnológico Metropolitano, ITM, Medellín 050013, Colombia
4
Department of Applied Mechanics, FEMTO-ST Institute, University Bourgogne Franche-Comté, UFC/CNRS/ENSMM/UTBM, Besançon 25000, France
*
Author to whom correspondence should be addressed.
Received: 29 November 2016 / Accepted: 3 January 2017 / Published: 31 January 2017
(This article belongs to the Section Physical Sensors)
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Abstract

This article concerns the characterization of the stability and performance of a motorized stage used in laser direct writing lithography. The system was built from commercial components and commanded by G-code. Measurements use a pseudo-periodic-pattern (PPP) observed by a camera and image processing is based on Fourier transform and phase measurement methods. The results report that the built system has a stability against vibrations determined by peak-valley deviations of 65 nm and 26 nm in the x and y directions, respectively, with a standard deviation of 10 nm in both directions. When the xy-stage is in movement, it works with a resolution of 0.36 μm, which is an acceptable value for most of research and development (R and D) microtechnology developments in which the typical feature size used is in the micrometer range. View Full-Text
Keywords: laser direct writing; photolithography; microfabrication; G-Code; high-resolution positioning; xy-stage laser direct writing; photolithography; microfabrication; G-Code; high-resolution positioning; xy-stage
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This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited. (CC BY 4.0).

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Jaramillo, J.; Zarzycki, A.; Galeano, J.; Sandoz, P. Performance Characterization of an xy-Stage Applied to Micrometric Laser Direct Writing Lithography. Sensors 2017, 17, 278.

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