Next Article in Journal
Next Article in Special Issue
Previous Article in Journal
Previous Article in Special Issue
Molecules 2012, 17(9), 10119-10130; doi:10.3390/molecules170910119
Article

Dry Etching of Copper Phthalocyanine Thin Films: Effects on Morphology and Surface Stoichiometry

1 and 1,2,*
Received: 16 July 2012; in revised form: 16 August 2012 / Accepted: 20 August 2012 / Published: 24 August 2012
(This article belongs to the Special Issue Tetrapyrroles, Porphyrins and Phthalocyanine)
Download PDF [1946 KB, uploaded 18 June 2014]
Abstract: We investigate the evolution of copper phthalocyanine thin films as they are etched with argon plasma. Significant morphological changes occur as a result of the ion bombardment; a planar surface quickly becomes an array of nanopillars which are less than 20 nm in diameter. The changes in morphology are independent of plasma power, which controls the etch rate only. Analysis by X-ray photoelectron spectroscopy shows that surface concentrations of copper and oxygen increase with etch time, while carbon and nitrogen are depleted. Despite these changes in surface stoichiometry, we observe no effect on the work function. The absorbance and X-ray diffraction spectra show no changes other than the peaks diminishing with etch time. These findings have important implications for organic photovoltaic devices which seek nanopillar thin films of metal phthalocyanine materials as an optimal structure.
Keywords: phthalocyanine dyes; vapor phase processes; dry etching; nanopillar formation phthalocyanine dyes; vapor phase processes; dry etching; nanopillar formation
This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

Export to BibTeX |
EndNote


MDPI and ACS Style

Van Dijken, J.G.; Brett, M.J. Dry Etching of Copper Phthalocyanine Thin Films: Effects on Morphology and Surface Stoichiometry. Molecules 2012, 17, 10119-10130.

AMA Style

Van Dijken JG, Brett MJ. Dry Etching of Copper Phthalocyanine Thin Films: Effects on Morphology and Surface Stoichiometry. Molecules. 2012; 17(9):10119-10130.

Chicago/Turabian Style

Van Dijken, Jaron G.; Brett, Michael J. 2012. "Dry Etching of Copper Phthalocyanine Thin Films: Effects on Morphology and Surface Stoichiometry." Molecules 17, no. 9: 10119-10130.


Molecules EISSN 1420-3049 Published by MDPI AG, Basel, Switzerland RSS E-Mail Table of Contents Alert