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Molecules 2012, 17(1), 527-555; doi:10.3390/molecules17010527

Recent Applications of the (TMS)3SiH Radical-Based Reagent

1
ISOF, Consiglio Nazionale delle Ricerche, 40129 Bologna, Italy
2
Institut de Science des Matériaux de Mulhouse IS2M, LRC CNRS 7228-ENSCMu-UHA, 15, rue Jean Starcky, 68057 Mulhouse Cedex, France
*
Author to whom correspondence should be addressed.
Received: 29 November 2011 / Revised: 29 December 2011 / Accepted: 2 January 2012 / Published: 6 January 2012
(This article belongs to the Special Issue Organosilicon Chemistry)
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Abstract

This review article focuses on the recent applications of tris(trimethylsilyl)silane as a radical-based reagent in organic chemistry. Numerous examples of the successful use of (TMS)3SiH in radical reductions, hydrosilylation and consecutive radical reactions are given. The use of (TMS)3SiH allows reactions to be carried out under mild conditions with excellent yields of products and remarkable chemo-, regio-, and stereoselectivity. The strategic role of (TMS)3SiH in polymerization is underlined with emphasis on the photo-induced radical polymerization of olefins and photo-promoted cationic polymerization of epoxides.
Keywords: tris(trimethylsilyl)silane; radical reactions; silyl radical; reduction; hydrosilylation; photopolymerization tris(trimethylsilyl)silane; radical reactions; silyl radical; reduction; hydrosilylation; photopolymerization
This is an open access article distributed under the Creative Commons Attribution License (CC BY 3.0).

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MDPI and ACS Style

Chatgilialoglu, C.; Lalevée, J. Recent Applications of the (TMS)3SiH Radical-Based Reagent. Molecules 2012, 17, 527-555.

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