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• Lalevée, J
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Molecules 2012, 17(1), 527-555; doi:10.3390/molecules17010527

Review

Recent Applications of the (TMS)₃SiH Radical-Based Reagent

Chryssostomos Chatgilialoglu ^1,*  and Jacques Lalevée ²

¹ ISOF, Consiglio Nazionale delle Ricerche, 40129 Bologna, Italy ² Institut de Science des Matériaux de Mulhouse IS2M, LRC CNRS 7228-ENSCMu-UHA, 15, rue Jean Starcky, 68057 Mulhouse Cedex, France

* Author to whom correspondence should be addressed.

Received: 29 November 2011; in revised form: 29 December 2011 / Accepted: 2 January 2012 / Published: 6 January 2012

(This article belongs to the Special Issue Organosilicon Chemistry)

Download PDF Full-Text [582 KB, uploaded 6 January 2012 14:17 CET]

Abstract: This review article focuses on the recent applications of tris(trimethylsilyl)silane as a radical-based reagent in organic chemistry. Numerous examples of the successful use of (TMS)₃SiH in radical reductions, hydrosilylation and consecutive radical reactions are given. The use of (TMS)₃SiH allows reactions to be carried out under mild conditions with excellent yields of products and remarkable chemo-, regio-, and stereoselectivity. The strategic role of (TMS)₃SiH in polymerization is underlined with emphasis on the photo-induced radical polymerization of olefins and photo-promoted cationic polymerization of epoxides.

Keywords: tris(trimethylsilyl)silane; radical reactions; silyl radical; reduction; hydrosilylation; photopolymerization

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