Analytical and Numerical Temperature Prediction in Direct Metal Deposition of Ti6Al4V
AbstractDirect Metal Deposition (DMD) is an additive manufacturing (AM) process capable of producing large components using a layer by layer deposition of molten powder. DMD is increasingly investigated due to its higher deposition rate and the possibility to produce large structural components specifically for the aerospace industry. During fabrication, a complex thermal history is experienced in different regions of the workpiece, depending on the process parameters and part geometry. The thermal history induces residual stress accumulation in the buildup, which is the main cause of distortions. In order to control the process and enhance the product quality, the understanding of the workpiece temperature is substantial. In this study, two methods to predict temperature evolution during the DMD process are introduced based on analytical and finite element methods. The objective is to compare these methods to experimental results and to provide more insights about their capabilities to predict accurately the temperature gradient, the cooling rate, and the melt pool geometry. A comparison of the computational time is also provided. Based on the results of the investigation, It appears that the analytical method provides an effective and accurate method to understand the influence of the process on the workpiece temperature. View Full-Text
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de La Batut, B.; Fergani, O.; Brotan, V.; Bambach, M.; El Mansouri, M. Analytical and Numerical Temperature Prediction in Direct Metal Deposition of Ti6Al4V. J. Manuf. Mater. Process. 2017, 1, 3.
de La Batut B, Fergani O, Brotan V, Bambach M, El Mansouri M. Analytical and Numerical Temperature Prediction in Direct Metal Deposition of Ti6Al4V. Journal of Manufacturing and Materials Processing. 2017; 1(1):3.Chicago/Turabian Style
de La Batut, Benoit; Fergani, Omar; Brotan, Vegard; Bambach, Markus; El Mansouri, Mohamed. 2017. "Analytical and Numerical Temperature Prediction in Direct Metal Deposition of Ti6Al4V." J. Manuf. Mater. Process. 1, no. 1: 3.
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