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Processes 2014, 2(2), 441-465; doi:10.3390/pr2020441
Review

Microreactor-Assisted Solution Deposition for Compound Semiconductor Thin Films

1,2
, 2,3
 and 1,2,*
Received: 7 January 2014; in revised form: 4 May 2014 / Accepted: 6 May 2014 / Published: 27 May 2014
Abstract: State-of-the-art techniques for the fabrication of compound semiconductors are mostly vacuum-based physical vapor or chemical vapor deposition processes. These vacuum-based techniques typically operate at high temperatures and normally require higher capital costs. Solution-based techniques offer opportunities to fabricate compound semiconductors at lower temperatures and lower capital costs. Among many solution-based deposition processes, chemical bath deposition is an attractive technique for depositing semiconductor films, owing to its low temperature, low cost and large area deposition capability. Chemical bath deposition processes are mainly performed using batch reactors, where all reactants are fed into the reactor simultaneously and products are removed after the processing is finished. Consequently, reaction selectivity is difficult, which can lead to unwanted secondary reactions. Microreactor-assisted solution deposition processes can overcome this limitation by producing short-life molecular intermediates used for heterogeneous thin film synthesis and quenching the reaction prior to homogeneous reactions. In this paper, we present progress in the synthesis and deposition of semiconductor thin films with a focus on CdS using microreactor-assisted solution deposition and provide an overview of its prospect for scale-up.
Keywords: microreactor; continuous flow; semiconductor; nanomaterial; nanostructure; thin film; solution process microreactor; continuous flow; semiconductor; nanomaterial; nanostructure; thin film; solution process
This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

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MDPI and ACS Style

Choi, C.-H.; Paul, B.K.; Chang, C.-H. Microreactor-Assisted Solution Deposition for Compound Semiconductor Thin Films. Processes 2014, 2, 441-465.

AMA Style

Choi C-H, Paul BK, Chang C-H. Microreactor-Assisted Solution Deposition for Compound Semiconductor Thin Films. Processes. 2014; 2(2):441-465.

Chicago/Turabian Style

Choi, Chang-Ho; Paul, Brian K.; Chang, Chih-Hung. 2014. "Microreactor-Assisted Solution Deposition for Compound Semiconductor Thin Films." Processes 2, no. 2: 441-465.

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