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Technologies 2016, 4(2), 12; doi:10.3390/technologies4020012

Magnetic Resonance Lithography with Nanometer Resolution

1
Institute for Quantum Science and Engineering (IQSE) and Department of Physics and Astronomy, Texas A&M University, College Station, TX 77843-4242, USA
2
The National Center for Applied Physics, KACST, P.O.Box 6086, Riyadh 11442, Saudi Arabia
3
Department of Electrical & Computer Engineering, Texas A&M University, College Station, TX 77843-4242, USA
These authors contributed equally to this work.
*
Author to whom correspondence should be addressed.
Academic Editors: Ronald E. Meyers and Yanhua Shih
Received: 15 February 2016 / Revised: 4 April 2016 / Accepted: 13 April 2016 / Published: 18 April 2016
(This article belongs to the Special Issue Quantum Imaging)
View Full-Text   |   Download PDF [1725 KB, uploaded 22 July 2016]   |  

Abstract

We propose an approach for super-resolution optical lithography which is based on the inverse of magnetic resonance imaging (MRI). The technique uses atomic coherence in an ensemble of spin systems whose final state population can be optically detected. In principle, our method is capable of producing arbitrary one and two dimensional high-resolution patterns with high contrast. View Full-Text
Keywords: superresolution; subwavelength lithography; NMR imaging; optically detected magnetic resonance superresolution; subwavelength lithography; NMR imaging; optically detected magnetic resonance
This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited. (CC BY 4.0).

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MDPI and ACS Style

AlGhannam, F.; Hemmer, P.; Liao, Z.; Zubairy, M.S. Magnetic Resonance Lithography with Nanometer Resolution. Technologies 2016, 4, 12.

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