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Journal: Nanomaterials, 2020
Volume: 10
Number: 666

Article: In Situ Study of the Impact of Aberration-Corrected Electron-Beam Lithography on the Electronic Transport of Suspended Graphene Devices
Authors: by Naomi Mizuno, Fernando Camino and Xu Du
Link: https://www.mdpi.com/2079-4991/10/4/666

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