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Appl. Sci. 2018, 8(8), 1292; https://doi.org/10.3390/app8081292

Towards Non-Degenerate Quantum Lithography

1
MOE Key Laboratory for Nonequilibrium Synthesis and Modulation of Condensed Matter, Department of Applied Physics, Xi’an Jiaotong University, Xi’an 710049, China
2
Institute for Quantum Science and Engineering, Texas A & M University, College Station, TX 77843, USA
3
Electronic Materials Research Laboratory, Key Laboratory of the Ministry of Education & International Center for Dielectric Research, School of Electronic and Information Engineering, Xi’an Jiaotong University, Xi’an 710049, China
4
Department of Physics, University of Maryland, Baltimore County, Baltimore, MD 21250, USA
*
Author to whom correspondence should be addressed.
Received: 29 June 2018 / Revised: 28 July 2018 / Accepted: 31 July 2018 / Published: 3 August 2018
(This article belongs to the Special Issue Ghost Imaging)
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Abstract

The photonic de Broglie wavelength of a non-degenerate entangled photon pair is measured by using a Young’s double slit interferometer, which proves that the non-degenerate entangled photon pairs have the potential to be used in quantum lithography. Experimental results show that the de Broglie wavelength of non-degenerate biphotons is well defined and its wavelength is neither the wavelength of the signal photon, nor the wavelength of the idler photon. According to the de Broglie equation, its wavelength corresponds to the momentum of the biphoton, which equals the sum of the momenta of signal and idler photons. The non-degenerate ghost interference/diffraction is also observed in these experiments. View Full-Text
Keywords: quantum lithography; entangled photon pairs; quantum imaging quantum lithography; entangled photon pairs; quantum imaging
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Zhou, Y.; Peng, T.; Chen, H.; Liu, J.; Shih, Y. Towards Non-Degenerate Quantum Lithography. Appl. Sci. 2018, 8, 1292.

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