Materials 2013, 6(9), 4096-4108; doi:10.3390/ma6094096
Article

Complete Permittivity Tensor in Sputtered CuFe2O4 Thin Films at Photon Energies between 2 and 5 eV

Received: 26 July 2013; in revised form: 19 August 2013 / Accepted: 26 August 2013 / Published: 16 September 2013
This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
Abstract: This work is devoted to the systematic study of the optical and magneto-optical properties of sputter deposited CuFe2O4 thin films in the photon energy region between 2 and 5 eV using spectroscopic ellipsometry and magneto-optical Kerr spectroscopy. The spectral dependence of both the diagonal and off-diagonal elements of the permittivity tensor is determined. A complete picture about the electron transitions in CuFe2O4 is suggested in the frame of intervalence charge transfer and intersublattice charge transfer transitions. The effect of deposition conditions and post-deposition treatment in CuFe2O4 films upon the optical and magneto-optical properties is discussed.
Keywords: spectroscopic ellipsometry; magneto-optics; spinel ferrite; CuFe2O4; permittivity tensor
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MDPI and ACS Style

Veis, M.; Antos, R.; Visnovsky, S.; Kulkarni, P.D.; Venkataramani, N.; Prasad, S.; Mistrik, J.; Krishnan, R. Complete Permittivity Tensor in Sputtered CuFe2O4 Thin Films at Photon Energies between 2 and 5 eV. Materials 2013, 6, 4096-4108.

AMA Style

Veis M, Antos R, Visnovsky S, Kulkarni PD, Venkataramani N, Prasad S, Mistrik J, Krishnan R. Complete Permittivity Tensor in Sputtered CuFe2O4 Thin Films at Photon Energies between 2 and 5 eV. Materials. 2013; 6(9):4096-4108.

Chicago/Turabian Style

Veis, Martin; Antos, Roman; Visnovsky, Stefan; Kulkarni, Prasanna D.; Venkataramani, Narayanan; Prasad, Shiva; Mistrik, Jan; Krishnan, Ramanathan. 2013. "Complete Permittivity Tensor in Sputtered CuFe2O4 Thin Films at Photon Energies between 2 and 5 eV." Materials 6, no. 9: 4096-4108.

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