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Magneto-Optical Thin Films for On-Chip Monolithic Integration of Non-Reciprocal Photonic Devices
State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, No. 4 Sec. 2 Jianshe N. Street, Chengdu 610054, China
Department of Materials Science & Engineering, University of Delaware, 305 DuPont Hall, Newark, DE 19716, USA
Department of Materials Science & Engineering, Massachusetts Institute of Technology, 77 Massachusetts Ave., Cambridge, MA 02139, USA
Current Address: Huawei Technologies Co., Ltd., Bantian, Longgang District, Shenzhen 518129, China
Current Address: Samsung Electronics Co., Ltd., Mt. 14-1, Nongseo-Dong, Giheung-Gu, Yongin-Si, Gyeonggi-Do 449-712, Korea
* Author to whom correspondence should be addressed.
Received: 8 July 2013; in revised form: 9 September 2013 / Accepted: 6 October 2013 / Published: 8 November 2013
Abstract: Achieving monolithic integration of nonreciprocal photonic devices on semiconductor substrates has been long sought by the photonics research society. One way to achieve this goal is to deposit high quality magneto-optical oxide thin films on a semiconductor substrate. In this paper, we review our recent research activity on magneto-optical oxide thin films toward the goal of monolithic integration of nonreciprocal photonic devices on silicon. We demonstrate high Faraday rotation at telecommunication wavelengths in several novel magnetooptical oxide thin films including Co substituted CeO2−δ, Co- or Fe-substituted SrTiO3−δ, as well as polycrystalline garnets on silicon. Figures of merit of 3~4 deg/dB and 21 deg/dB are achieved in epitaxial Sr(Ti0.2Ga0.4Fe0.4)O3−δ and polycrystalline (CeY2)Fe5O12 films, respectively. We also demonstrate an optical isolator on silicon, based on a racetrack resonator using polycrystalline (CeY2)Fe5O12/silicon strip-loaded waveguides. Our work demonstrates that physical vapor deposited magneto-optical oxide thin films on silicon can achieve high Faraday rotation, low optical loss and high magneto-optical figure of merit, therefore enabling novel high-performance non-reciprocal photonic devices monolithically integrated on semiconductor substrates.
Keywords: monolithic integration; magneto-optics; magnetic oxides; thin films; optical isolator; optical resonator
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Cite This Article
MDPI and ACS Style
Bi, L.; Hu, J.; Jiang, P.; Kim, H.S.; Kim, D.H.; Onbasli, M.C.; Dionne, G.F.; Ross, C.A. Magneto-Optical Thin Films for On-Chip Monolithic Integration of Non-Reciprocal Photonic Devices. Materials 2013, 6, 5094-5117.
Bi L, Hu J, Jiang P, Kim HS, Kim DH, Onbasli MC, Dionne GF, Ross CA. Magneto-Optical Thin Films for On-Chip Monolithic Integration of Non-Reciprocal Photonic Devices. Materials. 2013; 6(11):5094-5117.
Bi, Lei; Hu, Juejun; Jiang, Peng; Kim, Hyun S.; Kim, Dong H.; Onbasli, Mehmet C.; Dionne, Gerald F.; Ross, Caroline A. 2013. "Magneto-Optical Thin Films for On-Chip Monolithic Integration of Non-Reciprocal Photonic Devices." Materials 6, no. 11: 5094-5117.