The Surface of Nanoparticle Silicon as Studied by Solid-State NMR

Abstract: The surface structure and adjacent interior of commercially available silicon nanopowder (np-Si) was studied using multinuclear, solid-state NMR spectroscopy. The results are consistent with an overall picture in which the bulk of the np-Si interior consists of highly ordered (“crystalline”) silicon atoms, each bound tetrahedrally to four other silicon atoms. From a combination of ¹H, ²⁹Si and ²H magic-angle-spinning (MAS) NMR results and quantum mechanical ²⁹Si chemical shift calculations, silicon atoms on the surface of “as-received” np-Si were found to exist in a variety of chemical structures, with apparent populations in the order (a) (Si–O–)₃Si–H > (b) (Si–O–)₃SiOH > (c) (HO–)_nSi(Si)_m(–OSi)_4−m−n ≈ (d) (Si–O–)₂Si(H)OH > (e) (Si–O–)₂Si(–OH)₂ > (f) (Si–O–)₄Si, where Si stands for a surface silicon atom and Si represents another silicon atom that is attached to Si by either a Si–Si bond or a Si–O–Si linkage. The relative populations of each of these structures can be modified by chemical treatment, including with O₂ gas at elevated temperature. A deliberately oxidized sample displays an increased population of (Si–O–)₃Si–H, as well as (Si–O–)₃SiOH sites. Considerable heterogeneity of some surface structures was observed. A combination of ¹H and ²H MAS experiments provide evidence for a substantial population of silanol (Si–OH) moieties, some of which are not readily H-exchangeable, along with the dominant Si–H sites, on the surface of “as-received” np-Si; the silanol moieties are enhanced by deliberate oxidation. An extension of the DEPTH background suppression method is also demonstrated that permits measurement of the T₂ relaxation parameter simultaneously with background suppression.