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Materials 2010, 3(10), 4811-4841; doi:10.3390/ma3104811
Review

Ion-Induced Nanoscale Ripple Patterns on Si Surfaces: Theory and Experiment

1,2,*  and 1
1 Institute of Ion Beam Physics and Materials Research, Forschungszentrum Dresden-Rossendorf, P.O. Box 51 01 19, D-01314 Dresden, Germany 2 Interdisciplinary Nanoscience Center (iNANO), Aarhus University, Ny Munkegade, DK-8000 Aarhus C, Denmark
* Author to whom correspondence should be addressed.
Received: 31 August 2010 / Revised: 18 October 2010 / Accepted: 19 October 2010 / Published: 22 October 2010
(This article belongs to the Special Issue Nanomaterials)
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Abstract

Nanopatterning of solid surfaces by low-energy ion bombardment has received considerable interest in recent years. This interest was partially motivated by promising applications of nanopatterned substrates in the production of functional surfaces. Especially nanoscale ripple patterns on Si surfaces have attracted attention both from a fundamental and an application related point of view. This paper summarizes the theoretical basics of ion-induced pattern formation and compares the predictions of various continuum models to experimental observations with special emphasis on the morphology development of Si surfaces during sub-keV ion sputtering.
Keywords: nanopatterning; ion sputtering; surface morphology; continuum theory nanopatterning; ion sputtering; surface morphology; continuum theory
This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

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Keller, A.; Facsko, S. Ion-Induced Nanoscale Ripple Patterns on Si Surfaces: Theory and Experiment. Materials 2010, 3, 4811-4841.

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