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Sensors 2009, 9(1), 311-326; doi:10.3390/s90100311
Article

Emission Characteristics and Factors of Selected Odorous Compounds at a Wastewater Treatment Plant

1
, 2,*  and 1
Received: 20 October 2008; in revised form: 25 December 2008 / Accepted: 26 December 2008 / Published: 8 January 2009
(This article belongs to the Section Physical Sensors)
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Abstract: This study was initiated to explore the emission characteristics of Reduced Sulfur Compounds (RSCs: hydrogen sulfide, methyl mercaptan, dimethyl sulfide, dimethyl disulfide), ammonia and trimethylamine from a Wastewater Treatment Plant (WWTP) located at Sun-Cheon, Chonlanam-Do in South Korea. The study also evaluates flux profiles of the six selected odorous compounds and their flux rates (µg/m2/min) and compares their emission characteristics. A Dynamic Flux Chamber DFC was used to measure fluxes of pollutants from the treatment plant. Quality control of odor samples using a non-reactive sulfur dioxide gas determined the time taken for DFC concentration to reach equilibrium. The reduced sulfur compounds were analyzed by interfacing gas chromatography with a Pulsed Flame Photometric Detector (PFPD). Air samples were collected in the morning and afternoon on one day during summer (August) and two days in winter (December and January). Their emission rates were determined and it was observed that during summer relatively higher amounts of the selected odorous compounds were emitted compared to winter. Air samples from primary settling basin, aeration basin, and final settling basin were tested and the total amount of selected odorous compounds emitted per wastewater ton was found to be 1344 µg/m3 from the selected treatment processes. It was also observed that, in this study, the dominant odor intensity contribution was caused by dimethyl disulfide (69.1%).
Keywords: Odorous compounds; emission characteristics; Dynamic Flux Chamber (DFC) Odorous compounds; emission characteristics; Dynamic Flux Chamber (DFC)
This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

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MDPI and ACS Style

Jeon, E.-C.; Son, H.-K.; Sa, J.-H. Emission Characteristics and Factors of Selected Odorous Compounds at a Wastewater Treatment Plant. Sensors 2009, 9, 311-326.

AMA Style

Jeon E-C, Son H-K, Sa J-H. Emission Characteristics and Factors of Selected Odorous Compounds at a Wastewater Treatment Plant. Sensors. 2009; 9(1):311-326.

Chicago/Turabian Style

Jeon, Eui-Chan; Son, Hyun-Keun; Sa, Jae-Hwan. 2009. "Emission Characteristics and Factors of Selected Odorous Compounds at a Wastewater Treatment Plant." Sensors 9, no. 1: 311-326.


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