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Sensors 2008, 8(4), 2662-2672; doi:10.3390/s8042662
Article

CMOS Humidity Sensor System Using Carbon Nitride Film as Sensing Materials

1,* , 2 and 3
Received: 12 February 2008; Accepted: 10 April 2008 / Published: 14 April 2008
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Abstract: An integrated humidity sensor system with nano-structured carbon nitride film as humidity sensing material is fabricated by a 0.8 μm analog mixed CMOS process. The integrated sensor system consists of differential humidity sensitive field effect transistors (HUSFET), temperature sensor, and operational amplifier. The process contains two poly, two metal and twin well technology. To form CNx film on Si3N4/Si substrate, plasma etching is performed to the gate area as well as trenches. CNx film is deposited by reactive RF magnetron sputtering method and patterned by the lift-off technique. The drain current is proportional to the dielectric constant, and the sensitivity is 2.8 ㎂/%RH.
Keywords: Integrated sensors; Humidity; CMOS; Carbon nitride film Integrated sensors; Humidity; CMOS; Carbon nitride film
This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

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MDPI and ACS Style

Lee, S.P.; Lee, J.G.; Chowdhury, S. CMOS Humidity Sensor System Using Carbon Nitride Film as Sensing Materials. Sensors 2008, 8, 2662-2672.

AMA Style

Lee SP, Lee JG, Chowdhury S. CMOS Humidity Sensor System Using Carbon Nitride Film as Sensing Materials. Sensors. 2008; 8(4):2662-2672.

Chicago/Turabian Style

Lee, Sung P.; Lee, Ji G.; Chowdhury, Shaestagir. 2008. "CMOS Humidity Sensor System Using Carbon Nitride Film as Sensing Materials." Sensors 8, no. 4: 2662-2672.


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