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Sensors 2008, 8(3), 1508-1518; doi:10.3390/s8031508
Article

Synthesis and Characterization of Carbon Nitride Films for Micro Humidity Sensors

Department of Electronic Engineering, Kyungnam University, Masan, Kyungnam 631-701, Korea
Received: 23 January 2008 / Accepted: 26 February 2008 / Published: 3 March 2008
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Abstract

Nano-structured carbon nitride (CNx) films were synthesized by a reactive RFmagnetron sputtering system with a DC bias under various deposition conditions, and theirphysical and electrical properties were investigated with a view to using them for microhumidity sensors. The FTIR spectra of the deposited films showed a C=N stretching bandin the range of 1600~1700 ㎝-1, depending on the amount of nitrogen incorporation. Thecarbon nitride films deposited on the Si substrate had a nano-structured surfacemorphology with a grain size of about 20 nm, and their deposition rate was 1.5 μm/hr. Thesynthesized films had a high electrical resistivity in the range of 108 to 109 ω·cm,depending on the deposition conditions. The micro humidity sensors showed a goodlinearity and low hysteresis between 5 ~ 95 %RH.
Keywords: nano-structure; carbon nitride film; humidity sensors; sputtering system nano-structure; carbon nitride film; humidity sensors; sputtering system
This is an open access article distributed under the Creative Commons Attribution License (CC BY 3.0).
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Lee, S.P. Synthesis and Characterization of Carbon Nitride Films for Micro Humidity Sensors. Sensors 2008, 8, 1508-1518.

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