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Sensors 2008, 8(3), 1508-1518; doi:10.3390/s8031508
Article

Synthesis and Characterization of Carbon Nitride Films for Micro Humidity Sensors

Received: 23 January 2008; Accepted: 26 February 2008 / Published: 3 March 2008
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Abstract: Nano-structured carbon nitride (CNx) films were synthesized by a reactive RFmagnetron sputtering system with a DC bias under various deposition conditions, and theirphysical and electrical properties were investigated with a view to using them for microhumidity sensors. The FTIR spectra of the deposited films showed a C=N stretching bandin the range of 1600~1700 ㎝-1, depending on the amount of nitrogen incorporation. Thecarbon nitride films deposited on the Si substrate had a nano-structured surfacemorphology with a grain size of about 20 nm, and their deposition rate was 1.5 μm/hr. Thesynthesized films had a high electrical resistivity in the range of 108 to 109 ω·cm,depending on the deposition conditions. The micro humidity sensors showed a goodlinearity and low hysteresis between 5 ~ 95 %RH.
Keywords: nano-structure; carbon nitride film; humidity sensors; sputtering system nano-structure; carbon nitride film; humidity sensors; sputtering system
This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

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MDPI and ACS Style

Lee, S.P. Synthesis and Characterization of Carbon Nitride Films for Micro Humidity Sensors. Sensors 2008, 8, 1508-1518.

AMA Style

Lee SP. Synthesis and Characterization of Carbon Nitride Films for Micro Humidity Sensors. Sensors. 2008; 8(3):1508-1518.

Chicago/Turabian Style

Lee, Sung P. 2008. "Synthesis and Characterization of Carbon Nitride Films for Micro Humidity Sensors." Sensors 8, no. 3: 1508-1518.



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