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Sensors 2003, 3(6), 187-191; doi:10.3390/s30600187

New Method of Vapour Discrimination Using the Thickness Shear Mode (TSM) Resonator

* , , , ,  and
Nanotechnology Research Laboratories, School of Engineering, Sheffield Hallam University, City Campus, Pond Street, Sheffield, S1 1WB, UK
* Author to whom correspondence should be addressed.
Received: 31 March 2003 / Accepted: 3 May 2003 / Published: 30 June 2003
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The Impedance analysis technique complimented with curve fitting software was used to monitor changes in film properties of Thickness Shear Mode (TSM) resonator on vapour exposure. The approach demonstrates how sensor selectivity can be achieved through unique changes in film viscosity caused by organic vapour adsorption.
Keywords: Impedance Analysis; QCM; TSM resonator; BVD model Impedance Analysis; QCM; TSM resonator; BVD model
This is an open access article distributed under the Creative Commons Attribution License (CC BY) which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

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Holloway, A.F.; Nabok, A.; Thompson, M.; Ray, A.K.; Crowther, D.; Siddiqi, J. New Method of Vapour Discrimination Using the Thickness Shear Mode (TSM) Resonator. Sensors 2003, 3, 187-191.

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