Sensors 2003, 3(6), 187-191; doi:10.3390/s30600187
Article

New Method of Vapour Discrimination Using the Thickness Shear Mode (TSM) Resonator

Nanotechnology Research Laboratories, School of Engineering, Sheffield Hallam University, City Campus, Pond Street, Sheffield, S1 1WB, UK
* Author to whom correspondence should be addressed.
Received: 31 March 2003; Accepted: 3 May 2003 / Published: 30 June 2003
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Abstract: The Impedance analysis technique complimented with curve fitting software was used to monitor changes in film properties of Thickness Shear Mode (TSM) resonator on vapour exposure. The approach demonstrates how sensor selectivity can be achieved through unique changes in film viscosity caused by organic vapour adsorption.
Keywords: Impedance Analysis; QCM; TSM resonator; BVD model

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MDPI and ACS Style

Holloway, A.F.; Nabok, A.; Thompson, M.; Ray, A.K.; Crowther, D.; Siddiqi, J. New Method of Vapour Discrimination Using the Thickness Shear Mode (TSM) Resonator. Sensors 2003, 3, 187-191.

AMA Style

Holloway AF, Nabok A, Thompson M, Ray AK, Crowther D, Siddiqi J. New Method of Vapour Discrimination Using the Thickness Shear Mode (TSM) Resonator. Sensors. 2003; 3(6):187-191.

Chicago/Turabian Style

Holloway, A. F.; Nabok, A.; Thompson, M.; Ray, A. K.; Crowther, D.; Siddiqi, J. 2003. "New Method of Vapour Discrimination Using the Thickness Shear Mode (TSM) Resonator." Sensors 3, no. 6: 187-191.

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