In-Process Atomic-Force Microscopy (AFM) Based Inspection
AbstractA new in-process atomic-force microscopy (AFM) based inspection is presented for nanolithography to compensate for any deviation such as instantaneous degradation of the lithography probe tip. Traditional method used the AFM probes for lithography work and retract to inspect the obtained feature but this practice degrades the probe tip shape and hence, affects the measurement quality. This paper suggests a second dedicated lithography probe that is positioned back-to-back to the AFM probe under two synchronized controllers to correct any deviation in the process compared to specifications. This method shows that the quality improvement of the nanomachining, in progress probe tip wear, and better understanding of nanomachining. The system is hosted in a recently developed nanomanipulator for educational and research purposes. View Full-Text
Scifeed alert for new publicationsNever miss any articles matching your research from any publisher
- Get alerts for new papers matching your research
- Find out the new papers from selected authors
- Updated daily for 49'000+ journals and 6000+ publishers
- Define your Scifeed now
Mekid, S. In-Process Atomic-Force Microscopy (AFM) Based Inspection. Sensors 2017, 17, 1194.
Mekid S. In-Process Atomic-Force Microscopy (AFM) Based Inspection. Sensors. 2017; 17(6):1194.Chicago/Turabian Style
Mekid, Samir. 2017. "In-Process Atomic-Force Microscopy (AFM) Based Inspection." Sensors 17, no. 6: 1194.
Note that from the first issue of 2016, MDPI journals use article numbers instead of page numbers. See further details here.