Sensors 2012, 12(12), 16390-16403; doi:10.3390/s121216390
Article

Using an SU-8 Photoresist Structure and Cytochrome C Thin Film Sensing Material for a Microbolometer

Graduate Institute of Photonics and Optoelectronics, National Taiwan University, No. 1, Roosevelt Road, Section 4, Taipei 106, Taiwan
* Author to whom correspondence should be addressed.
Received: 8 November 2012; in revised form: 20 November 2012 / Accepted: 21 November 2012 / Published: 27 November 2012
(This article belongs to the Section Physical Sensors)
PDF Full-text Download PDF Full-Text [585 KB, uploaded 27 November 2012 13:03 CET]
Abstract: There are two critical parameters for microbolometers: the temperature coefficient of resistance (TCR) of the sensing material, and the thermal conductance of the insulation structure. Cytochrome c protein, having a high TCR, is a good candidate for infrared detection. We can use SU-8 photoresist for the thermal insulation structure, given its low thermal conductance. In this study, we designed a platform structure based on a SU-8 photoresist. We fabricated an infrared sensing pixel and recorded a high TCR for this new structure. The SU-8 photoresist insulation structure was fabricated using the exposure dose method. We experimentally demonstrated high values of TCR from 22%/K to 25.7%/K, and the measured noise was 1.2 × 10–8 V2/Hz at 60 Hz. When the bias current was 2 μA, the calculated voltage responsivity was 1.16 × 105 V/W. This study presents a new kind of microbolometer based on cytochrome c protein on top of an SU-8 photoresist platform that does not require expensive vacuum deposition equipment.
Keywords: cytochrome c; temperature coefficient of resistance (TCR); SU-8; microbolometer; exposure dose method

Article Statistics

Load and display the download statistics.

Citations to this Article

Cite This Article

MDPI and ACS Style

Lai, J.-L.; Liao, C.-J.; Su, G.-D.J. Using an SU-8 Photoresist Structure and Cytochrome C Thin Film Sensing Material for a Microbolometer. Sensors 2012, 12, 16390-16403.

AMA Style

Lai J-L, Liao C-J, Su G-DJ. Using an SU-8 Photoresist Structure and Cytochrome C Thin Film Sensing Material for a Microbolometer. Sensors. 2012; 12(12):16390-16403.

Chicago/Turabian Style

Lai, Jian-Lun; Liao, Chien-Jen; Su, Guo-Dung J. 2012. "Using an SU-8 Photoresist Structure and Cytochrome C Thin Film Sensing Material for a Microbolometer." Sensors 12, no. 12: 16390-16403.

Sensors EISSN 1424-8220 Published by MDPI AG, Basel, Switzerland RSS E-Mail Table of Contents Alert