Sensors 2011, 11(7), 6942-6953; doi:10.3390/s110706942

Highly Mass-Sensitive Thin Film Plate Acoustic Resonators (FPAR)

1email, 2email, 3, 3email, 2email, 1email and 1,* email
Received: 8 May 2011; in revised form: 8 June 2011 / Accepted: 28 June 2011 / Published: 4 July 2011
(This article belongs to the Special Issue Emerging Acoustic Wave-Based Sensors)
This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
Abstract: The mass sensitivity of thin aluminum nitride (AlN) film S0 Lamb wave resonators is theoretically and experimentally studied. Theoretical predictions based on modal and finite elements method analysis are experimentally verified. Here, two-port 888 MHz synchronous FPARs are micromachined and subsequently coated with hexamethyl-disiloxane(HMDSO)-plasma-polymerized thin films of various thicknesses. Systematic data on frequency shift and insertion loss versus film thickness are presented. FPARs demonstrate high mass-loading sensitivity as well as good tolerance towards the HMDSO viscous losses. Initial measurements in gas phase environment are further presented.
Keywords: resonator; aluminum nitride; membrane; HMDSO; gravimetric; sensitivity
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MDPI and ACS Style

Arapan, L.; Alexieva, G.; Avramov, I.D.; Radeva, E.; Strashilov, V.; Katardjiev, I.; Yantchev, V. Highly Mass-Sensitive Thin Film Plate Acoustic Resonators (FPAR). Sensors 2011, 11, 6942-6953.

AMA Style

Arapan L, Alexieva G, Avramov ID, Radeva E, Strashilov V, Katardjiev I, Yantchev V. Highly Mass-Sensitive Thin Film Plate Acoustic Resonators (FPAR). Sensors. 2011; 11(7):6942-6953.

Chicago/Turabian Style

Arapan, Lilia; Alexieva, Gergana; Avramov, Ivan D.; Radeva, Ekaterina; Strashilov, Vesseline; Katardjiev, Ilia; Yantchev, Ventsislav. 2011. "Highly Mass-Sensitive Thin Film Plate Acoustic Resonators (FPAR)." Sensors 11, no. 7: 6942-6953.

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