Int. J. Mol. Sci. 2005, 6(3), 198-202; doi:10.3390/i6030198
Article

Study on the XPS-ESCA of Aluminum Phosphide Products

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Received: 1 August 2004; Accepted: 18 May 2005 / Published: 25 May 2005
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Abstract: XPS-ESCA analysis showed small signal for phosphorus in fresh specimens of aluminum phosphide (AlP). After removal of a layer of about 0.5 – 1.0 μm by argon ion sputtering, it was observed that signal intensities from oxygen and aluminum increased. The oxygen signal decreased as a function of sputtering time, synchronously with the increase of the phosphorous signal from the AlP nucleus. The aluminum signal, which was considered to be mainly due to AlP and Al(OH)3, remained constant. Other impurity elements including N, Mg, etc., were identified in the technical 85% AlP and AlP tablet formulated products.
Keywords: XPS; ESCA; aluminum phosphide
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MDPI and ACS Style

Pan, C.; Li, W.; Jiang, S. Study on the XPS-ESCA of Aluminum Phosphide Products. Int. J. Mol. Sci. 2005, 6, 198-202.

AMA Style

Pan C, Li W, Jiang S. Study on the XPS-ESCA of Aluminum Phosphide Products. International Journal of Molecular Sciences. 2005; 6(3):198-202.

Chicago/Turabian Style

Pan, Canping; Li, Weixi; Jiang, Shuren. 2005. "Study on the XPS-ESCA of Aluminum Phosphide Products." Int. J. Mol. Sci. 6, no. 3: 198-202.

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