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Molecules 2016, 21(12), 1711; doi:10.3390/molecules21121711

Plasma Processing with Fluorine Chemistry for Modification of Surfaces Wettability

National Institute for Lasers, Plasma and Radiation Physics, Atomistilor 409, Magurele-Bucharest, Ilfov 077125, Romania
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Academic Editor: Bela Torok
Received: 6 October 2016 / Revised: 29 November 2016 / Accepted: 5 December 2016 / Published: 13 December 2016
(This article belongs to the Special Issue Fluorine Chemistry 2016)
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Abstract

Using plasma in conjunction with fluorinated compounds is widely encountered in material processing. We discuss several plasma techniques for surface fluorination: deposition of fluorocarbon thin films either by magnetron sputtering of polytetrafluoroethylene targets, or by plasma-assisted chemical vapor deposition using tetrafluoroethane as a precursor, and modification of carbon nanowalls by plasma treatment in a sulphur hexafluoride environment. We showed that conformal fluorinated thin films can be obtained and, according to the initial surface properties, superhydrophobic surfaces can be achieved. View Full-Text
Keywords: plasma processing; fluorinated thin films; nanostructured surfaces; superhydrophobic surfaces plasma processing; fluorinated thin films; nanostructured surfaces; superhydrophobic surfaces
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This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited. (CC BY 4.0).

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MDPI and ACS Style

Satulu, V.; Ionita, M.D.; Vizireanu, S.; Mitu, B.; Dinescu, G. Plasma Processing with Fluorine Chemistry for Modification of Surfaces Wettability. Molecules 2016, 21, 1711.

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