Reprint

Micro-Nano Surface Functionalization of Materials and Thin Films for Optical Applications

Edited by
July 2021
88 pages
  • ISBN978-3-0365-1658-5 (Hardback)
  • ISBN978-3-0365-1657-8 (PDF)

This book is a reprint of the Special Issue Micro-Nano Surface Functionalization of Materials and Thin Films for Optical Applications that was published in

Chemistry & Materials Science
Engineering
Summary

This book contains the articles collected for the Special Issue entitled "Micro-nano Surface Functionalization of Materials and Thin Films for Optical Applications" in the journal Coatings (ISSN 2079-6412). These selected articles provide a meaningful overview of recent advances and concepts beyond the state-of-the-art regarding surface functionalization of materials and deposition of thin films to be used in optical applications. The aim was to cover all relevant aspects of the topic (simulation, design, fabrication, characterization and applications) with a special emphasis on non-conventional methods for surface modification of materials, combinations of mature fabrication routes with emerging technologies (i.e., additive manufacturing) and large-area fabrication concepts to pave the way to an industrial utilization of the developed materials. This overview comprises the recent work of reputed scientists from Germany, Austria, Spain and India on: - New developments on the scale-up deposition of transparent conductive materials by magnetron sputtering,- Design of hierarchical surface structures at different scale lengths for nanoimprinting of optical nano- and micro-structures, - Non-conventional preparation of rutile-type TiO2 films at room temperature for optical applications on heat-sensitive substrates, - Design of spectrally selective solar absorber coatings based on computational simulation and ellipsometry measurements.

Format
  • Hardback
License
© 2022 by the authors; CC BY-NC-ND license
Keywords
reactive magnetron sputtering; transparent conductive oxide; electronic transport; doping efficiency; tin dioxide; Nanoimprint lithography; UV-NIL; reversal NIL; liquid transfer imprint lithography; hierarchical structures; optical micro- and nanostructures; ITO thin films; magnetron sputtering; low temperature deposition; oxygen flow; microstructure; optoelectronic properties; transparent heaters; titanium oxide films; filtered cathodic vacuum arc; rutile; optical coatings; spectrally selective absorber; multilayer stack; spectroscopic ellipsometry; optical constants; simulation