High-Sensitivity H2 and CH4 SAW Sensors with Carbon Nanowalls and Improvement in Their Performance after Plasma Treatment
Abstract
:1. Introduction
2. Materials and Methods
2.1. Synthesis of CNWs and Their Plasma Treatment
2.2. Sensor Structure and Testing
3. Results and Discussion
4. Conclusions
Author Contributions
Funding
Institutional Review Board Statement
Informed Consent Statement
Data Availability Statement
Conflicts of Interest
References
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Sensitive Layer | Analyte | Concentration | Working Temperature | Reference |
---|---|---|---|---|
Reduced graphene oxide | H2/Ar H2 in synthetic air | 100 ppm 1000 ppm | RT | [47] |
Graphene oxide layers | H2 in synthetic air NO2 in synthetic air | 4–75% 125 ppm | 20–120 °C | [48] |
Graphene-like nano-sheets | H2 CO | 1% 1000 ppm | 25 °C | [9] |
Graphene– nickel–cryptophane | CH4 | 1% | RT | [49] |
CNW—vertical graphene | H2 CH4 | 7.9 ppm 4.3 ppm | RT | Actual work |
Sample | Name | Position | % Conc. |
---|---|---|---|
SAW@CNW | C 1s | 284.6 | 89.6 |
N 1s | 398.6 | 1.3 | |
O 1s | 532.6 | 9.1 | |
SAW@CNW_Treat | C 1s | 284.6 | 70.2 |
N 1s | 397.6 | 7.3 | |
O 1s | 532.6 | 22.5 |
H2 (%) | Sensitivity (Δf/c) (Hz/ppm) | LOD (3xn)/(Δf/c) (ppm) | ||
---|---|---|---|---|
Before Plasma Treatment | After Plasma Treatment | Before Plasma Treatment | After Plasma Treatment | |
0.02 | 5.6 | 9.5 | 13.39 | 7.89 |
0.04 | 5.78 | 9.75 | 12.99 | 7.69 |
0.06 | 5.5 | 9.08 | 13.64 | 8.26 |
0.08 | 5.68 | 9.5 | 13.22 | 7.89 |
0.1 | 5.55 | 9.2 | 13.51 | 8.15 |
CH4 (%) | Sensitivity (Δf/c) (Hz/ppm) | LOD (3xn)/(Δf/c) (ppm) | ||
---|---|---|---|---|
Before Plasma Treatment | After Plasma Treatment | Before Plasma Treatment | After Plasma Treatment | |
0.02 | 11.00 | 18.00 | 6.82 | 4.17 |
0.04 | 11.25 | 17.63 | 6.67 | 4.26 |
0.06 | 11.67 | 16.58 | 6.43 | 4.52 |
0.08 | 11.13 | 17.38 | 6.74 | 4.32 |
0.1 | 11.50 | 17.70 | 6.52 | 4.24 |
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Vizireanu, S.; Constantinoiu, I.; Satulu, V.; Stoica, S.D.; Viespe, C. High-Sensitivity H2 and CH4 SAW Sensors with Carbon Nanowalls and Improvement in Their Performance after Plasma Treatment. Chemosensors 2023, 11, 566. https://doi.org/10.3390/chemosensors11110566
Vizireanu S, Constantinoiu I, Satulu V, Stoica SD, Viespe C. High-Sensitivity H2 and CH4 SAW Sensors with Carbon Nanowalls and Improvement in Their Performance after Plasma Treatment. Chemosensors. 2023; 11(11):566. https://doi.org/10.3390/chemosensors11110566
Chicago/Turabian StyleVizireanu, Sorin, Izabela Constantinoiu, Veronica Satulu, Silviu Daniel Stoica, and Cristian Viespe. 2023. "High-Sensitivity H2 and CH4 SAW Sensors with Carbon Nanowalls and Improvement in Their Performance after Plasma Treatment" Chemosensors 11, no. 11: 566. https://doi.org/10.3390/chemosensors11110566