Next Article in Journal
Photocatalytic Activity of Reactively Sputtered Titania Coatings Deposited Using a Full Face Erosion Magnetron
Previous Article in Journal
An Investigation into W or Nb or ZnFe2O4 Doped Titania Nanocomposites Deposited from Blended Powder Targets for UV/Visible Photocatalysis
Coatings 2013, 3(3), 166-176; doi:10.3390/coatings3030166
Article

Characterisation Studies of the Structure and Properties of As-Deposited and Annealed Pulsed Magnetron Sputtered Titania Coatings

1,* , 1
, 1
, 2
 and 3
Received: 4 July 2013; in revised form: 26 August 2013 / Accepted: 30 August 2013 / Published: 10 September 2013
View Full-Text   |   Download PDF [802 KB, updated 11 September 2013; original version uploaded 10 September 2013]   |   Browse Figures
Abstract: Titanium dioxide thin films are durable, chemically stable, have a high refractive index and good electro/photochemical proprieties. Consequently, they are widely used as anti-reflective layers in optical devices and large area glazing products, dielectric layers in microelectronic devices and photo catalytic layers in self-cleaning surfaces. Titania coatings may have amorphous or crystalline structures, where three crystalline phases of TiO2 can be obtained: anatase, rutile and brookite, although the latter is rarely found. It is known, however, that the structure of TiO2 coatings is sensitive to deposition conditions and can also be modified by post-deposition heat treatments. In this study, titania coatings have been deposited onto soda-lime glass substrates by reactive sputtering from a metallic target. The magnetron was driven in mid-frequency pulsed DC mode. The as-deposited coatings were analysed by micro Raman spectroscopy, X-ray diffraction (XRD), atomic force microscopy (AFM) and scanning electron microscopy (SEM). Selected coatings were annealed at temperatures in the range 200–700 °C and re-analysed. Whilst there was weak evidence of a nanocrystallinity in the as-deposited films, it was observed that these largely amorphous low temperature structures converted into strongly crystalline structures at annealing temperatures above 400 °C.
Keywords: titanium dioxide; magnetron sputtering; Raman; XRD titanium dioxide; magnetron sputtering; Raman; XRD
This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

Export to BibTeX |
EndNote


MDPI and ACS Style

Kulczyk-Malecka, J.; Kelly, P.J.; West, G.; Clarke, G.C.; Ridealgh, J.A. Characterisation Studies of the Structure and Properties of As-Deposited and Annealed Pulsed Magnetron Sputtered Titania Coatings. Coatings 2013, 3, 166-176.

AMA Style

Kulczyk-Malecka J, Kelly PJ, West G, Clarke GC, Ridealgh JA. Characterisation Studies of the Structure and Properties of As-Deposited and Annealed Pulsed Magnetron Sputtered Titania Coatings. Coatings. 2013; 3(3):166-176.

Chicago/Turabian Style

Kulczyk-Malecka, Justyna; Kelly, Peter J.; West, Glen; Clarke, Gregory C.; Ridealgh, John A. 2013. "Characterisation Studies of the Structure and Properties of As-Deposited and Annealed Pulsed Magnetron Sputtered Titania Coatings." Coatings 3, no. 3: 166-176.


Coatings EISSN 2079-6412 Published by MDPI AG, Basel, Switzerland RSS E-Mail Table of Contents Alert