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Correction

Correction: Wen et al. Fabrication of Dense Gadolinia-Doped Ceria Coatings via Very-Low-Pressure Plasma Spray and Plasma Spray–Physical Vapor Deposition Process. Coatings 2019, 9, 717

1
School of Materials Science and Engineering, Central South University, Changsha 410083, China
2
Guangdong Institute of New Materials, National Engineering Laboratory for Modern Materials Surface Engineering Technology, the Key Lab of Guangdong for Modern Surface Engineering Technology, Guangzhou 510651, China
3
School of Environment and Energy, South China University of Technology, Guangzhou 510006, China
*
Author to whom correspondence should be addressed.
Co-first author.
Coatings 2020, 10(3), 292; https://doi.org/10.3390/coatings10030292
Submission received: 7 February 2020 / Accepted: 13 February 2020 / Published: 20 March 2020
The author wishes to make the following correction to this paper [1]. Due to mislabeling, replace:
Table 2. Parameters of the very-low-pressure plasma spray (VLPPS) and plasma spray–physical vapor deposition (PS-PVD).
Table 2. Parameters of the very-low-pressure plasma spray (VLPPS) and plasma spray–physical vapor deposition (PS-PVD).
ParametersVLPPS CoatingPS-PVD Coating
Pressure (Pa)150150
Current (A)7202600
TorchF4-VBO3CP
Power (kW)53126
Plasma gas (Ar) (slpm)a6030
Plasma gas (He) (slpm)a-90
Plasma gas (H2) (slpm)a12-
Powder feed rate (g·min−1)210
Spraying distance (mm)150800
Substrate temperature (°C)900–1000800–900
Torch speed (mm/s)300500
with
Table 2. Parameters of the very-low-pressure plasma spray (VLPPS) and plasma spray–physical vapor deposition (PS-PVD).
Table 2. Parameters of the very-low-pressure plasma spray (VLPPS) and plasma spray–physical vapor deposition (PS-PVD).
ParametersVLPPS CoatingPS-PVD Coating
Pressure (Pa)150150
Current (A)7202600
TorchF4-VBO3CP
Power (kW)53126
Plasma gas (Ar) (slpm)a6090
Plasma gas (He) (slpm)a-30
Plasma gas (H2) (slpm)a12-
Powder feed rate (g·min−1)210
Spraying distance (mm)250800
Substrate temperature (°C)900–1000800–900
Torch speed (mm/s)300500
The revised numbers are marked in red in the corrected table.
The authors would like to apologize for any inconvenience caused to the readers by these changes.

Reference

  1. Wen, J.; Song, C.; Liu, T.; Deng, Z.; Niu, S.; Zhang, Y.; Liu, L.; Liu, M. Fabrication of Dense Gadolinia-Doped Ceria Coatings via Very-Low-Pressure Plasma Spray and Plasma Spray–Physical Vapor Deposition Process. Coatings 2019, 9, 717. [Google Scholar] [CrossRef] [Green Version]

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MDPI and ACS Style

Wen, J.; Song, C.; Liu, T.; Deng, Z.; Niu, S.; Zhang, Y.; Liu, L.; Liu, M. Correction: Wen et al. Fabrication of Dense Gadolinia-Doped Ceria Coatings via Very-Low-Pressure Plasma Spray and Plasma Spray–Physical Vapor Deposition Process. Coatings 2019, 9, 717. Coatings 2020, 10, 292. https://doi.org/10.3390/coatings10030292

AMA Style

Wen J, Song C, Liu T, Deng Z, Niu S, Zhang Y, Liu L, Liu M. Correction: Wen et al. Fabrication of Dense Gadolinia-Doped Ceria Coatings via Very-Low-Pressure Plasma Spray and Plasma Spray–Physical Vapor Deposition Process. Coatings 2019, 9, 717. Coatings. 2020; 10(3):292. https://doi.org/10.3390/coatings10030292

Chicago/Turabian Style

Wen, Jing, Chen Song, Taikai Liu, Ziqian Deng, Shaopeng Niu, Yapeng Zhang, Libin Liu, and Min Liu. 2020. "Correction: Wen et al. Fabrication of Dense Gadolinia-Doped Ceria Coatings via Very-Low-Pressure Plasma Spray and Plasma Spray–Physical Vapor Deposition Process. Coatings 2019, 9, 717" Coatings 10, no. 3: 292. https://doi.org/10.3390/coatings10030292

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