Feasible Route for a Large Area Few-Layer MoS2 with Magnetron Sputtering
Abstract
:1. Introduction
2. Materials and Methods
3. Results and Discussion
4. Conclusions
Author Contributions
Funding
Conflicts of Interest
References
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RF Power (W) | A1g (cm−1) | (cm−1) | Δk (A1g-) (cm−1) | Full Width at Half-Maximum (cm−1) | LA(M) to A1g Peak Intensity Ration | |
---|---|---|---|---|---|---|
A1g | ||||||
10 | 405.2 ± 0.1 | 381.2 ± 0.1 | 24.0 ± 0.02 | 10.64 ± 0.46 | 10.87 ± 0.56 | 0.219 ± 0.010 |
80 | 405.4 ± 0.4 | 381.4 ± 0.4 | 24.0 ± 0.01 | 10.17 ± 0.34 | 10.31 ± 0.21 | 0.195 ± 0.004 |
120 | 407.0 ± 0.1 | 383.0 ± 0.1 | 24.0 ± 0.02 | 9.55 ± 0.02 | 9.57 ± 0.20 | 0.180 ± 0.003 |
150 | 403.7 ± 0.4 | 379.7 ± 0.4 | 24.0 ± 0.02 | 10.49 ± 0.13 | 10.56 ± 0.02 | 0.204 ± 0.006 |
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Zhong, W.; Deng, S.; Wang, K.; Li, G.; Li, G.; Chen, R.; Kwok, H.-S. Feasible Route for a Large Area Few-Layer MoS2 with Magnetron Sputtering. Nanomaterials 2018, 8, 590. https://doi.org/10.3390/nano8080590
Zhong W, Deng S, Wang K, Li G, Li G, Chen R, Kwok H-S. Feasible Route for a Large Area Few-Layer MoS2 with Magnetron Sputtering. Nanomaterials. 2018; 8(8):590. https://doi.org/10.3390/nano8080590
Chicago/Turabian StyleZhong, Wei, Sunbin Deng, Kai Wang, Guijun Li, Guoyuan Li, Rongsheng Chen, and Hoi-Sing Kwok. 2018. "Feasible Route for a Large Area Few-Layer MoS2 with Magnetron Sputtering" Nanomaterials 8, no. 8: 590. https://doi.org/10.3390/nano8080590