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Addendum to Nanomaterials 2019, 9(10), 1394.
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Addendum

Addendum: Zhang, C., et al. Pulsed Laser-Assisted Helium Ion Nanomachining of Monolayer Graphene—Direct-Write Kirigami Patterns. Nanomaterials 2019, 9, 1394

by
Cheng Zhang
1,2,
Ondrej Dyck
2,
David A. Garfinkel
1,
Michael G. Stanford
1,
Alex A. Belianinov
2,
Jason D. Fowlkes
2,
Stephen Jesse
2 and
Philip D. Rack
1,2,*
1
Department of Materials Science and Engineering, University of Tennessee, Knoxville, TN 37996, USA
2
Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, TN 37831, USA
*
Author to whom correspondence should be addressed.
Nanomaterials 2020, 10(2), 273; https://doi.org/10.3390/nano10020273
Submission received: 5 February 2020 / Accepted: 6 February 2020 / Published: 6 February 2020
Versions Notes
The authors wish to make the following corrections to this paper [1]:
The funding section needs to be corrected. The updated information is included below:
Funding: The authors (P.D.R., J.D.F. and A.A.B.) acknowledge support from the Center for Nanophase Materials Sciences, which is a DOE Office of the Science User Facility. The authors (O.D. and S.J.) acknowledge support by the U.S. Department of Energy, Office of Science, Basic Energy Sciences, Materials Science and Engineering Division. C.Z. and M.G.S. acknowledge support from the U.S. Department of Energy (DOE) under grant no. DE-SC0002136. D.A.G. acknowledges the support by NSF CBET-1603780.
This addendum does not cause any changes to the results or conclusions in the original published paper.
The authors would like to apologize for any inconvenience caused to the readers by these changes.

Reference

  1. Zhang, C.; Dyck, O.; Garfinkel, D.A.; Stanford, M.G.; Belianinov, A.A.; Fowlkes, J.D.; Jesse, S.; Rack, P.D. Pulsed Laser-Assisted Helium Ion Nanomachining of Monolayer Graphene—Direct-Write Kirigami Patterns. Nanomaterials 2019, 9, 1394. [Google Scholar] [CrossRef] [PubMed] [Green Version]

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MDPI and ACS Style

Zhang, C.; Dyck, O.; Garfinkel, D.A.; Stanford, M.G.; Belianinov, A.A.; Fowlkes, J.D.; Jesse, S.; Rack, P.D. Addendum: Zhang, C., et al. Pulsed Laser-Assisted Helium Ion Nanomachining of Monolayer Graphene—Direct-Write Kirigami Patterns. Nanomaterials 2019, 9, 1394. Nanomaterials 2020, 10, 273. https://doi.org/10.3390/nano10020273

AMA Style

Zhang C, Dyck O, Garfinkel DA, Stanford MG, Belianinov AA, Fowlkes JD, Jesse S, Rack PD. Addendum: Zhang, C., et al. Pulsed Laser-Assisted Helium Ion Nanomachining of Monolayer Graphene—Direct-Write Kirigami Patterns. Nanomaterials 2019, 9, 1394. Nanomaterials. 2020; 10(2):273. https://doi.org/10.3390/nano10020273

Chicago/Turabian Style

Zhang, Cheng, Ondrej Dyck, David A. Garfinkel, Michael G. Stanford, Alex A. Belianinov, Jason D. Fowlkes, Stephen Jesse, and Philip D. Rack. 2020. "Addendum: Zhang, C., et al. Pulsed Laser-Assisted Helium Ion Nanomachining of Monolayer Graphene—Direct-Write Kirigami Patterns. Nanomaterials 2019, 9, 1394" Nanomaterials 10, no. 2: 273. https://doi.org/10.3390/nano10020273

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