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Appl. Sci. 2017, 7(7), 720; doi:10.3390/app7070720

SwissFEL: The Swiss X-ray Free Electron Laser

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1,* and 1,*
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Paul Scherrer Institute, 5232 Villigen-PSI, Switzerland
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École Polytechnique Fédérale de Lausanne, 1015 Lausanne, Switzerland
Current address: CERN, 1211 Geneva, Switzerland.
Current address: Empa, 8600 Dübendorf, Switzerland.
§
Current address: Kistler AG, 8408 Winterthur, Switzerland.
Current address: Institute of Physics, Jan Kochanowski University, 25406 Kielce, Poland.
Current address: leadXpro AG, PARK innovAARE, 5234 Villigen, Switzerland.
*
Authors to whom correspondence should be addressed.
Academic Editor: Kiyoshi Ueda
Received: 13 June 2017 / Revised: 29 June 2017 / Accepted: 30 June 2017 / Published: 14 July 2017
(This article belongs to the Special Issue X-Ray Free-Electron Laser)

Abstract

The SwissFEL X-ray Free Electron Laser (XFEL) facility started construction at the Paul Scherrer Institute (Villigen, Switzerland) in 2013 and will be ready to accept its first users in 2018 on the Aramis hard X-ray branch. In the following sections we will summarize the various aspects of the project, including the design of the soft and hard X-ray branches of the accelerator, the results of SwissFEL performance simulations, details of the photon beamlines and experimental stations, and our first commissioning results. View Full-Text
Keywords: X-ray free electron laser; linac; X-rays; undulator; SwissFEL; X-ray optics; X-ray photon diagnostics; ultrafast X-ray science; X-ray detector; JUNGFRAU; serial femtosecond crystallography X-ray free electron laser; linac; X-rays; undulator; SwissFEL; X-ray optics; X-ray photon diagnostics; ultrafast X-ray science; X-ray detector; JUNGFRAU; serial femtosecond crystallography
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This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited. (CC BY 4.0).

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Milne, C.J.; Schietinger, T.; Aiba, M.; Alarcon, A.; Alex, J.; Anghel, A.; Arsov, V.; Beard, C.; Beaud, P.; Bettoni, S.; Bopp, M.; Brands, H.; Brönnimann, M.; Brunnenkant, I.; Calvi, M.; Citterio, A.; Craievich, P.; Csatari Divall, M.; Dällenbach, M.; D’Amico, M.; Dax, A.; Deng, Y.; Dietrich, A.; Dinapoli, R.; Divall, E.; Dordevic, S.; Ebner, S.; Erny, C.; Fitze, H.; Flechsig, U.; Follath, R.; Frei, F.; Gärtner, F.; Ganter, R.; Garvey, T.; Geng, Z.; Gorgisyan, I.; Gough, C.; Hauff, A.; Hauri, C.P.; Hiller, N.; Humar, T.; Hunziker, S.; Ingold, G.; Ischebeck, R.; Janousch, M.; Juranić, P.; Jurcevic, M.; Kaiser, M.; Kalantari, B.; Kalt, R.; Keil, B.; Kittel, C.; Knopp, G.; Koprek, W.; Lemke, H.T.; Lippuner, T.; Llorente Sancho, D.; Löhl, F.; Lopez-Cuenca, C.; Märki, F.; Marcellini, F.; Marinkovic, G.; Martiel, I.; Menzel, R.; Mozzanica, A.; Nass, K.; Orlandi, G.L.; Ozkan Loch, C.; Panepucci, E.; Paraliev, M.; Patterson, B.; Pedrini, B.; Pedrozzi, M.; Pollet, P.; Pradervand, C.; Prat, E.; Radi, P.; Raguin, J.-Y.; Redford, S.; Rehanek, J.; Réhault, J.; Reiche, S.; Ringele, M.; Rittmann, J.; Rivkin, L.; Romann, A.; Ruat, M.; Ruder, C.; Sala, L.; Schebacher, L.; Schilcher, T.; Schlott, V.; Schmidt, T.; Schmitt, B.; Shi, X.; Stadler, M.; Stingelin, L.; Sturzenegger, W.; Szlachetko, J.; Thattil, D.; Treyer, D.M.; Trisorio, A.; Tron, W.; Vetter, S.; Vicario, C.; Voulot, D.; Wang, M.; Zamofing, T.; Zellweger, C.; Zennaro, R.; Zimoch, E.; Abela, R.; Patthey, L.; Braun, H.-H. SwissFEL: The Swiss X-ray Free Electron Laser. Appl. Sci. 2017, 7, 720.

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