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Appl. Sci. 2017, 7(2), 174; doi:10.3390/app7020174

Low-Loss Micro-Resonator Filters Fabricated in Silicon by CMOS-Compatible Lithographic Techniques: Design and Characterization

1
Department of Electrical, Computer, and Biomedical Engineering, Università di Pavia, Pavia I-27100, Italy
2
Optoelectronics Research Centre, University of Southampton, Southampton SO17 1BJ, UK
3
Department of Civil Engineering and Architecture, Università di Pavia, Pavia I-27100, Italy
4
Photonic Department, CEA MINATEC Campus, Grenoble CEDEX F-38054, France
5
Istituto Superiore Mario Boella, Torino 10138, Italy
6
Dipartimento di Elettronica e Telecomunicazioni, Politecnico di Torino, Torino 10129, Italy
7
STMicroelectronics-Studio di Microelettronica, Via Ferrata 4, Pavia 27100, Italy
8
Photonic Packaging Group, Tyndall National Institute, Lee Maltings Complex, Cork T12R5CP, Ireland
*
Author to whom correspondence should be addressed.
Academic Editor: Totaro Imasaka
Received: 10 January 2017 / Revised: 25 January 2017 / Accepted: 7 February 2017 / Published: 11 February 2017
(This article belongs to the Special Issue Silicon Photonics Components and Applications)
View Full-Text   |   Download PDF [2326 KB, uploaded 11 February 2017]   |  

Abstract

Optical resonators are fundamental building-blocks for the development of Si-photonics-integrated circuits, as tunable on-chip optical filters. In addition to the specific spectral shape, which may vary according to a particular application, extremely low losses from these devices are a crucial requirement. In the current state-of-the-art devices, most low-loss filters have only been demonstrated by exploiting ad hoc lithographic and etching techniques, which are not compatible with the standard CMOS (complementary metal-oxide semiconductor) process-flow available at Si-photonic foundries. In this paper, we describe the design and optimization of optical micro-resonators, based on Si-waveguides with a height lower than the standard ones (i.e., less than 220 nm), prepared on SOI (silicon on insulator) platform, which allow the realization of high-performance optical filters with an insertion loss lower than 1 dB, using only previously validated lithographic etch-depths. View Full-Text
Keywords: Silicon photonics; Micro-rings; integrated filters; optical losses; optical components; integrated waveguides Silicon photonics; Micro-rings; integrated filters; optical losses; optical components; integrated waveguides
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This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited. (CC BY 4.0).

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Marchetti, R.; Vitali, V.; Lacava, C.; Cristiani, I.; Giuliani, G.; Muffato, V.; Fournier, M.; Abrate, S.; Gaudino, R.; Temporiti, E.; Carroll, L.; Minzioni, P. Low-Loss Micro-Resonator Filters Fabricated in Silicon by CMOS-Compatible Lithographic Techniques: Design and Characterization. Appl. Sci. 2017, 7, 174.

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