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Journal: Appl. Sci., 2012
Volume: 2
Page(s): 24-34
24-34
Article: Nanoimprint Resist Material Containing Ultraviolet Reactive Fluorine Surfactant for Defect Reduction in Lithographic Fabrication
Takei, S.; Sekiguchi, A.

http://www.mdpi.com/2076-3417/2/1/24

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