Photodeprotectable N-Alkoxybenzyl Aromatic Polyamides
AbstractN-alkoxybenzyl aromatic polyamides were synthesized by polycondensation of N-alkoxybenzyl aromatic diamine with equimolar dicarboxylic acid chloride in the presence of 2.2 equiv. of pyridine at room temperature for 2 days. The obtained polyamides were mainly cyclic polymers, as determined by means of matrix-assisted laser desorption ionization time-of-flight (MALDI-TOF) mass spectrometry, and showed higher solubility in organic solvents than unprotected aromatic polyamides. Photodeprotection of N-alkoxybenzyl aromatic polyamide film containing photo acid generator (PAG) proceeded well under UV irradiation (5 J/cm2), followed by heating at 130 °C for 15 min. The nature of the polymer end groups of N-alkoxybenzyl aromatic polyamides was found to be crucial for photodeprotection reactivity. These polymers are promising candidates for photosensitive heat-resistant materials for fine Cu wiring formation by electroless Cu plating of high-density semiconductor packaging substrates. View Full-Text
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Iwashita, K.; Katoh, H.; Ohta, Y.; Yokozawa, T. Photodeprotectable N-Alkoxybenzyl Aromatic Polyamides. Polymers 2017, 9, 246.
Iwashita K, Katoh H, Ohta Y, Yokozawa T. Photodeprotectable N-Alkoxybenzyl Aromatic Polyamides. Polymers. 2017; 9(7):246.Chicago/Turabian Style
Iwashita, Kenichi; Katoh, Hironobu; Ohta, Yoshihiro; Yokozawa, Tsutomu. 2017. "Photodeprotectable N-Alkoxybenzyl Aromatic Polyamides." Polymers 9, no. 7: 246.
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