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Block Copolymer Nanostructures for Technology
Center for Nanoscale Materials, Argonne National Laboratory, 9700 South Cass Avenue, Argonne, IL 60439, USA
* Author to whom correspondence should be addressed.
Received: 24 August 2010; in revised form: 25 September 2010 / Accepted: 15 October 2010 / Published: 20 October 2010
Abstract: Nanostructures generated from block copolymer self-assembly enable a variety of potential technological applications. In this article we review recent work and the current status of two major emerging applications of block copolymer (BCP) nanostructures: lithography for microelectronics and photovoltaics. We review the progress in BCP lithography in relation to the requirements of the semiconductor technology roadmap. For photovoltaic applications, we review the current status of the quest to generate ideal nanostructures using BCPs and directions for future research.
Keywords: block copolymer; lithography; photovoltaics
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MDPI and ACS Style
Tseng, Y.-C.; Darling, S.B. Block Copolymer Nanostructures for Technology. Polymers 2010, 2, 470-489.
Tseng Y-C, Darling SB. Block Copolymer Nanostructures for Technology. Polymers. 2010; 2(4):470-489.
Tseng, Yu-Chih; Darling, Seth B. 2010. "Block Copolymer Nanostructures for Technology." Polymers 2, no. 4: 470-489.