Next Article in Journal / Special Issue
Enhanced Photophysical Properties of Nanopatterned Titania Nanodots/Nanowires upon Hybridization with Silica via Block Copolymer Templated Sol-Gel Process
Previous Article in Journal / Special Issue
Design and Application of Nanoscale Actuators Using Block-Copolymers
Article Menu

Export Article

Open AccessReview
Polymers 2010, 2(4), 470-489; doi:10.3390/polym2040470

Block Copolymer Nanostructures for Technology

Center for Nanoscale Materials, Argonne National Laboratory, 9700 South Cass Avenue, Argonne, IL 60439, USA
Author to whom correspondence should be addressed.
Received: 24 August 2010 / Revised: 25 September 2010 / Accepted: 15 October 2010 / Published: 20 October 2010
(This article belongs to the Special Issue Nano-Structures of Block Copolymers)
View Full-Text   |   Download PDF [880 KB, uploaded 20 October 2010]   |  


Nanostructures generated from block copolymer self-assembly enable a variety of potential technological applications. In this article we review recent work and the current status of two major emerging applications of block copolymer (BCP) nanostructures: lithography for microelectronics and photovoltaics. We review the progress in BCP lithography in relation to the requirements of the semiconductor technology roadmap. For photovoltaic applications, we review the current status of the quest to generate ideal nanostructures using BCPs and directions for future research. View Full-Text
Keywords: block copolymer; lithography; photovoltaics block copolymer; lithography; photovoltaics

Figure 1

This is an open access article distributed under the Creative Commons Attribution License (CC BY 3.0).

Scifeed alert for new publications

Never miss any articles matching your research from any publisher
  • Get alerts for new papers matching your research
  • Find out the new papers from selected authors
  • Updated daily for 49'000+ journals and 6000+ publishers
  • Define your Scifeed now

SciFeed Share & Cite This Article

MDPI and ACS Style

Tseng, Y.-C.; Darling, S.B. Block Copolymer Nanostructures for Technology. Polymers 2010, 2, 470-489.

Show more citation formats Show less citations formats

Related Articles

Article Metrics

Article Access Statistics



[Return to top]
Polymers EISSN 2073-4360 Published by MDPI AG, Basel, Switzerland RSS E-Mail Table of Contents Alert
Back to Top