Polymers 2010, 2(4), 470-489; doi:10.3390/polym2040470
Review

Block Copolymer Nanostructures for Technology

Yu-Chih Tseng* email and Seth B. Darling
Center for Nanoscale Materials, Argonne National Laboratory, 9700 South Cass Avenue, Argonne, IL 60439, USA
* Author to whom correspondence should be addressed.
Received: 24 August 2010; in revised form: 25 September 2010 / Accepted: 15 October 2010 / Published: 20 October 2010
(This article belongs to the Special Issue Nano-Structures of Block Copolymers)
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Abstract: Nanostructures generated from block copolymer self-assembly enable a variety of potential technological applications. In this article we review recent work and the current status of two major emerging applications of block copolymer (BCP) nanostructures: lithography for microelectronics and photovoltaics. We review the progress in BCP lithography in relation to the requirements of the semiconductor technology roadmap. For photovoltaic applications, we review the current status of the quest to generate ideal nanostructures using BCPs and directions for future research.
Keywords: block copolymer; lithography; photovoltaics

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Cite This Article

MDPI and ACS Style

Tseng, Y.-C.; Darling, S.B. Block Copolymer Nanostructures for Technology. Polymers 2010, 2, 470-489.

AMA Style

Tseng Y-C, Darling SB. Block Copolymer Nanostructures for Technology. Polymers. 2010; 2(4):470-489.

Chicago/Turabian Style

Tseng, Yu-Chih; Darling, Seth B. 2010. "Block Copolymer Nanostructures for Technology." Polymers 2, no. 4: 470-489.

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