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Polymers 2010, 2(4), 470-489; doi:10.3390/polym2040470
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Block Copolymer Nanostructures for Technology

*  and
Center for Nanoscale Materials, Argonne National Laboratory, 9700 South Cass Avenue, Argonne, IL 60439, USA
* Author to whom correspondence should be addressed.
Received: 24 August 2010 / Revised: 25 September 2010 / Accepted: 15 October 2010 / Published: 20 October 2010
(This article belongs to the Special Issue Nano-Structures of Block Copolymers)
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Abstract

Nanostructures generated from block copolymer self-assembly enable a variety of potential technological applications. In this article we review recent work and the current status of two major emerging applications of block copolymer (BCP) nanostructures: lithography for microelectronics and photovoltaics. We review the progress in BCP lithography in relation to the requirements of the semiconductor technology roadmap. For photovoltaic applications, we review the current status of the quest to generate ideal nanostructures using BCPs and directions for future research.
Keywords: block copolymer; lithography; photovoltaics block copolymer; lithography; photovoltaics
This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

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Tseng, Y.-C.; Darling, S.B. Block Copolymer Nanostructures for Technology. Polymers 2010, 2, 470-489.

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