Next Article in Journal
Effects of Al-Impurity Type on Formation Energy, Crystal Structure, Electronic Structure, and Optical Properties of ZnO by Using Density Functional Theory and the Hubbard-U Method
Next Article in Special Issue
Photoresponsive Polymeric Reversible Nanoparticles via Self-Assembly of Reactive ABA Triblock Copolymers and Their Transformation to Permanent Nanostructures
Previous Article in Journal
Quaternized Cellulose Hydrogels as Sorbent Materials and Pickering Emulsion Stabilizing Agents
Article Menu
Issue 8 (August) cover image

Export Article

Open AccessArticle
Materials 2016, 9(8), 648; doi:10.3390/ma9080648

Directed Self-Assembly on Photo-Crosslinked Polystyrene Sub-Layers: Nanopattern Uniformity and Orientation

Inorganic Materials Laboratory, Samsung Advanced Institute of Technology (SAIT), Samsung Material Research Complex, 130 Samsung-ro, Yeongtong-gu, Suwon-si, Gyeonggi-do 443-803, Korea
*
Author to whom correspondence should be addressed.
Academic Editor: Massimo Lazzari
Received: 23 June 2016 / Revised: 20 July 2016 / Accepted: 26 July 2016 / Published: 1 August 2016
View Full-Text   |   Download PDF [2090 KB, uploaded 1 August 2016]   |  

Abstract

A photo-crosslinked polystyrene (PS) thin film is investigated as a potential guiding sub-layer for polystyrene-block-poly (methyl methacrylate) block copolymer (BCP) cylindrical nanopattern formation via topographic directed self-assembly (DSA). When compared to a non-crosslinked PS brush sub-layer, the photo-crosslinked PS sub-layer provided longer correlation lengths of the BCP nanostructure, resulting in a highly uniform DSA nanopattern with a low number of BCP dislocation defects. Depending on the thickness of the sub-layer used, parallel or orthogonal orientations of DSA nanopattern arrays were obtained that covered the entire surface of patterned Si substrates, including both trench and mesa regions. The design of DSA sub-layers and guide patterns, such as hardening the sub-layer by photo-crosslinking, nano-structuring on mesas, the relation between trench/mesa width, and BCP equilibrium period, were explored with a view to developing defect-reduced DSA lithography technology. View Full-Text
Keywords: block copolymer; directed self-assembly; polystyrene sub-layer; photo-crosslinking; DSA uniformity block copolymer; directed self-assembly; polystyrene sub-layer; photo-crosslinking; DSA uniformity
Figures

Figure 1

This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited. (CC BY 4.0).

Supplementary material

Scifeed alert for new publications

Never miss any articles matching your research from any publisher
  • Get alerts for new papers matching your research
  • Find out the new papers from selected authors
  • Updated daily for 49'000+ journals and 6000+ publishers
  • Define your Scifeed now

SciFeed Share & Cite This Article

MDPI and ACS Style

Koh, H.-D.; Kim, M.-J. Directed Self-Assembly on Photo-Crosslinked Polystyrene Sub-Layers: Nanopattern Uniformity and Orientation. Materials 2016, 9, 648.

Show more citation formats Show less citations formats

Note that from the first issue of 2016, MDPI journals use article numbers instead of page numbers. See further details here.

Related Articles

Article Metrics

Article Access Statistics

1

Comments

[Return to top]
Materials EISSN 1996-1944 Published by MDPI AG, Basel, Switzerland RSS E-Mail Table of Contents Alert
Back to Top