Effect of Annealing Temperature and Oxygen Flow in the Properties of Ion Beam Sputtered SnO—2x Thin Films
Abstract
:1. Introduction
2. Results and Discussion
2.1. Structural and Morphological Properties
2.2. Electrical Properties
3. Experimental Section
4. Conclusions
Acknowledgments
Author Contributions
Conflicts of Interest
References
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Wang, C.-M.; Huang, C.-C.; Kuo, J.-C.; Sahu, D.R.; Huang, J.-L. Effect of Annealing Temperature and Oxygen Flow in the Properties of Ion Beam Sputtered SnO—2x Thin Films. Materials 2015, 8, 5289-5297. https://doi.org/10.3390/ma8085243
Wang C-M, Huang C-C, Kuo J-C, Sahu DR, Huang J-L. Effect of Annealing Temperature and Oxygen Flow in the Properties of Ion Beam Sputtered SnO—2x Thin Films. Materials. 2015; 8(8):5289-5297. https://doi.org/10.3390/ma8085243
Chicago/Turabian StyleWang, Chun-Min, Chun-Chieh Huang, Jui-Chao Kuo, Dipti Ranjan Sahu, and Jow-Lay Huang. 2015. "Effect of Annealing Temperature and Oxygen Flow in the Properties of Ion Beam Sputtered SnO—2x Thin Films" Materials 8, no. 8: 5289-5297. https://doi.org/10.3390/ma8085243