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Materials 2015, 8(6), 3352-3363; doi:10.3390/ma8063352

The pH Sensing Properties of RF Sputtered RuO2 Thin-Film Prepared Using Different Ar/O2 Flow Ratio

Electron Science Research Institute, Edith Cowan University, Joondalup, WA 6027, Australia
Author to whom correspondence should be addressed.
Academic Editor: Elisabetta Comini
Received: 29 April 2015 / Revised: 29 May 2015 / Accepted: 2 June 2015 / Published: 9 June 2015
(This article belongs to the Special Issue Nanostructured Materials for Chemical Sensing Applications)
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The influence of the Ar/O2 gas ratio during radio frequency (RF) sputtering of the RuO2 sensing electrode on the pH sensing performance is investigated. The developed pH sensor consists in an RF sputtered ruthenium oxide thin-film sensing electrode, in conjunction with an electroplated Ag/AgCl reference electrode. The performance and characterization of the developed pH sensors in terms of sensitivity, response time, stability, reversibility, and hysteresis are investigated. Experimental results show that the pH sensor exhibits super-Nernstian slopes in the range of 64.33–73.83 mV/pH for Ar/O2 gas ratio between 10/0–7/3. In particular, the best pH sensing performance, in terms of sensitivity, response time, reversibility and hysteresis, is achieved when the Ar/O2 gas ratio is 8/2, at which a high sensitivity, a low hysteresis and a short response time are attained simultaneously. View Full-Text
Keywords: thin film; sputtering; metal oxide; pH sensing; electrochemical properties thin film; sputtering; metal oxide; pH sensing; electrochemical properties

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This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited. (CC BY 4.0).

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MDPI and ACS Style

Sardarinejad, A.; Maurya, D.K.; Alameh, K. The pH Sensing Properties of RF Sputtered RuO2 Thin-Film Prepared Using Different Ar/O2 Flow Ratio. Materials 2015, 8, 3352-3363.

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