Single Layer Broadband Anti-Reflective Coatings for Plastic Substrates Produced by Full Wafer and Roll-to-Roll Step-and-Flash Nano-Imprint Lithography
Abstract
:1. Introduction
2. Results and Discussion
2.1. ARCs Produced by Full Wafer Step-and-Flash NIL
2.1.1. Replication and Imprint Process
Material | Lateral pitch (nm) | Average depth (nm) |
---|---|---|
Holotools mold | 250 | 300 |
h-PDMS | 250 | 300 |
Ormocomp | 250 | 284 |
2.1.2. Optical Properties of Moth Eye-Structured Ormocomp Coating
2.1.3. Adhesion and Scratch Resistance
Coating | Imprint | Undamaged-damaged pencil hardness |
---|---|---|
Ormocomp | moth eye-structured | <4B |
Ormocomp | non-structured | HB–F |
Uncoated polycarbonate | 2B–B |
Coating | Imprint | Undamaged-damaged pencil hardness |
---|---|---|
Ormocomp | moth eye-structured | <4B |
Ormocomp | non-structured | 2H–3H |
Uncoated PMMA | 3H–4H |
2.1.4. Durability of the ARCs
Uncoated/coated PMMA | ΔR [%] Damp heat 1000 h 85 °C 85% RH | ΔR [%] Thermal cycling 200 cycles −40/85 °C | ΔR [%] Humidity freeze 10 cycles 85 °C 85% RH to −40 °C |
---|---|---|---|
Uncoated PMMA | +0.10 | 0.00 | +0.07 |
Ormocomp non-structured | +1.11 | +0.93 | +0.57 |
Ormocomp moth eye-structured | +1.16 | −0.08 | −0.32 |
2.2. Anti-Reflective Coatings Produced by Roll-to-Roll UV NIL
3. Experimental Section
3.1. Materials and Equipment
3.2. The Wafer-by-Wafer NIL Process
3.2.1. Preparation of the Replica
3.2.2. Structuring of the Ormocomp Resist
3.3. Characterization of Nanostructured Surfaces
3.3.1. HIM
3.3.2. AFM
3.4. Optical Characterization
3.5. Scratch Resistance Measurements
3.6. Durability Tests
4. Conclusions
Acknowledgments
Conflicts of Interest
References
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Burghoorn, M.; Roosen-Melsen, D.; De Riet, J.; Sabik, S.; Vroon, Z.; Yakimets, I.; Buskens, P. Single Layer Broadband Anti-Reflective Coatings for Plastic Substrates Produced by Full Wafer and Roll-to-Roll Step-and-Flash Nano-Imprint Lithography. Materials 2013, 6, 3710-3726. https://doi.org/10.3390/ma6093710
Burghoorn M, Roosen-Melsen D, De Riet J, Sabik S, Vroon Z, Yakimets I, Buskens P. Single Layer Broadband Anti-Reflective Coatings for Plastic Substrates Produced by Full Wafer and Roll-to-Roll Step-and-Flash Nano-Imprint Lithography. Materials. 2013; 6(9):3710-3726. https://doi.org/10.3390/ma6093710
Chicago/Turabian StyleBurghoorn, Marieke, Dorrit Roosen-Melsen, Joris De Riet, Sami Sabik, Zeger Vroon, Iryna Yakimets, and Pascal Buskens. 2013. "Single Layer Broadband Anti-Reflective Coatings for Plastic Substrates Produced by Full Wafer and Roll-to-Roll Step-and-Flash Nano-Imprint Lithography" Materials 6, no. 9: 3710-3726. https://doi.org/10.3390/ma6093710