Materials 2012, 5(5), 889-908; doi:10.3390/ma5050889
Review

Strained Silicon Photonics

Clemens Schriever 1,* email, Christian Bohley 1 email, Jörg Schilling 1 email and Ralf B. Wehrspohn 2,3 email
1 Centre for Innovation Competence SiLi-nano, Martin-Luther-University Halle-Wittenberg, Karl-Freiherr-von-Fritsch-Str. 3, Halle (Saale) 06120, Germany 2 Fraunhofer Institute for Mechanics of Materials, Walter-Hülse-Str. 1, Halle (Saale) 06120, Germany 3 Institute of Physics, Martin-Luther-University Halle-Wittenberg, Heinrich-Damerow-Str. 4, Halle (Saale) 06120, Germany
* Author to whom correspondence should be addressed.
Received: 22 March 2012; in revised form: 9 May 2012 / Accepted: 9 May 2012 / Published: 22 May 2012
(This article belongs to the Special Issue Photonic Materials and Applications)
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Abstract: A review of recent progress in the field of strained silicon photonics is presented. The application of strain to waveguide and photonic crystal structures can be used to alter the linear and nonlinear optical properties of these devices. Here, methods for the fabrication of strained devices are summarized and recent examples of linear and nonlinear optical devices are discussed. Furthermore, the relation between strain and the enhancement of the second order nonlinear susceptibility is investigated, which may enable the construction of optically active photonic devices made of silicon.
Keywords: silicon photonics; strain engineering; nonlinear optical properties

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MDPI and ACS Style

Schriever, C.; Bohley, C.; Schilling, J.; Wehrspohn, R.B. Strained Silicon Photonics. Materials 2012, 5, 889-908.

AMA Style

Schriever C, Bohley C, Schilling J, Wehrspohn RB. Strained Silicon Photonics. Materials. 2012; 5(5):889-908.

Chicago/Turabian Style

Schriever, Clemens; Bohley, Christian; Schilling, Jörg; Wehrspohn, Ralf B. 2012. "Strained Silicon Photonics." Materials 5, no. 5: 889-908.

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