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Materials 2010, 3(2), 1172-1185; doi:10.3390/ma3021172

Thermal Stability and Sublimation Pressures of Some Ruthenocene Compounds

Thermodynamics, IVG, Faculty of Engineering, and CeNIDE, University of Duisburg Essen, Lotharstr. 1, 47057 Duisburg, Germany
Department of Inorganic Chemistry, Institute of Chemistry, Faculty of Science,Chemnitz Technical University, Straße der Nationen 62, 09111 Chemnitz, Germany
Authors to whom correspondence should be addressed.
Received: 11 December 2009 / Revised: 29 January 2010 / Accepted: 10 February 2010 / Published: 15 February 2010
(This article belongs to the Special Issue Organometallic Compounds)
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We set out to study the use of a series of ruthenocenes as possible and promising sources for ruthenium and/or ruthenium oxide film formation.The thermal stability of a series of ruthenocenes, including (η5-C5H4R)(η5-C5H4R´)Ru (1), R = R´ = H (3), R = H, R´ = CH2NMe2 (5), R = H, R´= C(O)Me (6), R = R´ = C(O)Me (7), R = H, R´ = C(O)(CH2)3CO2H (8), R = H, R´ = C(O)(CH2)2CO2H (9), R = H, R´ = C(O)(CH2)3CO2Me (10), R = H, R´= C(O)(CH2)2CO2Me (11), R = R´ = SiMe3), (η5-C4H3O-2,4-Me2)2Ru (2), and (η5-C5H5-2,4-Me2)2Ru (4) was studied by thermogravimetry. From these studies, it could be concluded that 1–4, 6 and 9–11 are the most thermally stable molecules. The sublimation pressure of these sandwich compounds was measured using a Knudsen cell. Among these, the compound 11 shows the highest vapor pressure.
Keywords: ruthenocene; sublimation / vapor pressure; thermal stability ruthenocene; sublimation / vapor pressure; thermal stability
This is an open access article distributed under the Creative Commons Attribution License (CC BY 3.0).

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MDPI and ACS Style

Siddiqi, M.A.; Siddiqui, R.A.; Atakan, B.; Roth, N.; Lang, H. Thermal Stability and Sublimation Pressures of Some Ruthenocene Compounds. Materials 2010, 3, 1172-1185.

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