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Materials 2010, 3(2), 1172-1185; doi:10.3390/ma3021172
Article

Thermal Stability and Sublimation Pressures of Some Ruthenocene Compounds

1,* , 1
,
1
,
2
 and
2,*
1 Thermodynamics, IVG, Faculty of Engineering, and CeNIDE, University of Duisburg Essen, Lotharstr. 1, 47057 Duisburg, Germany 2 Department of Inorganic Chemistry, Institute of Chemistry, Faculty of Science,Chemnitz Technical University, Straße der Nationen 62, 09111 Chemnitz, Germany
* Authors to whom correspondence should be addressed.
Received: 11 December 2009 / Revised: 29 January 2010 / Accepted: 10 February 2010 / Published: 15 February 2010
(This article belongs to the Special Issue Organometallic Compounds)
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Abstract

We set out to study the use of a series of ruthenocenes as possible and promising sources for ruthenium and/or ruthenium oxide film formation.The thermal stability of a series of ruthenocenes, including (η5-C5H4R)(η5-C5H4R´)Ru (1), R = R´ = H (3), R = H, R´ = CH2NMe2 (5), R = H, R´= C(O)Me (6), R = R´ = C(O)Me (7), R = H, R´ = C(O)(CH2)3CO2H (8), R = H, R´ = C(O)(CH2)2CO2H (9), R = H, R´ = C(O)(CH2)3CO2Me (10), R = H, R´= C(O)(CH2)2CO2Me (11), R = R´ = SiMe3), (η5-C4H3O-2,4-Me2)2Ru (2), and (η5-C5H5-2,4-Me2)2Ru (4) was studied by thermogravimetry. From these studies, it could be concluded that 1–4, 6 and 9–11 are the most thermally stable molecules. The sublimation pressure of these sandwich compounds was measured using a Knudsen cell. Among these, the compound 11 shows the highest vapor pressure.
Keywords: ruthenocene; sublimation / vapor pressure; thermal stability ruthenocene; sublimation / vapor pressure; thermal stability
This is an open access article distributed under the Creative Commons Attribution License (CC BY 3.0).
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Siddiqi, M.A.; Siddiqui, R.A.; Atakan, B.; Roth, N.; Lang, H. Thermal Stability and Sublimation Pressures of Some Ruthenocene Compounds. Materials 2010, 3, 1172-1185.

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