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Editorial

Acknowledgement to Reviewers of JMMP in 2019

by
JMMP Editorial Office
MDPI, St. Alban-Anlage 66, 4052 Basel, Switzerland
J. Manuf. Mater. Process. 2020, 4(1), 6; https://doi.org/10.3390/jmmp4010006
Published: 20 January 2020
The editorial team greatly appreciates the reviewers who have dedicated their considerable time and expertise to the journal’s rigorous editorial process over the past 12 months, regardless of whether the papers are finally published or not. In 2019, a total of 96 papers were published in the journal, with a median time to first decision of 15 days and a median time from submission to publication of 38 days. The editors would like to express their sincere gratitude to the following reviewers for their generous contribution in 2019:
Abeyrathna, BuddhikaMilovančević, Miloš
Acciari, HeloisaMonsalve, Alberto
Ahad, Inam UlMoon, Seung-Jae
Alexopoulos, KosmasMoon, Young Hoon
Alves de Sousa, Ricardo J.Moraczewski, Krzysztof
Arif, KhalidMuñoz, Ángel
Ascroft, HelenMurčinková, Zuzana
Bartel, ThorstenMuszka, Krzysztof
Bartkowiak, TomaszMystkowska, Joanna
Batista, MoisesNadolny, Krzysztof
Bechtsis, DimitriosNam, Jungsoo
Belhocine, AliNele, Luigi
Bellantone, VincenzoNemeş, Ovidiu
Ben-Artzy, AdiNeslušan, Miroslav
Bergmann, Jean-PierreNezafati, Marjan
Boccarusso, LucaNowak, Wojciech
Boddeti, NarasimhaOkunkova, Anna A.
Bolelli, GiovanniOmrani, Emad
Bonilla-Cruz, JoséPantazopoulos, George A.
Boumerzoug, ZakariaParab, Niranjan D.
Breaz, Radu EugenPatel, Jigneshkumar
Buchely, MarioPater, Zbigniew
Buj Corral, IrenePereira, Octavio
Cai, FengPhuah, Xin Li
Caminero Torija, Miguel ÁngelPilipovic, Ana
Carou, DiegoPimenov, Danil Yu
Casalino, GiuseppePolanski, Marek
Celentano, DiegoPou, Juan
Chen, Roland K.Pramanik, Brahmananda
Chen, ZhitongPrates, Pedro
Chiba, KazuhisaPresz, Wojciech
Cho, SunghunQi, Zhuyuan
Christie, SteveQin, Hantang
Correa, DiegoRafiee, Mohammad
Daudt, Natália De FreitasRahman Rashid, Rizwan Abdul
Davoudinejad, AliRebaioli, Lara
De Marco, CarmelaReiner, Johannes
de Souza, Adriano FagaliRosenkranz, Andreas
Deja, MariuszRoy, Sougata
Dirrenberger, J.Rudolf, Rebeka
Dixon, David A.Saboori, Abdollah
Donñate, Cristina MartiínSaha, Manik Lal
Dudina, DinaSałaciński, Tedeusz
Dyl, TomaszSalguero, Jorge
Edström, DanielSalmi, Mika
Ehrmann, AndreaSánchez, Antonio
Elkaseer, AhmedSato, Ryuta
Farina, IleniaSchicchi, Diego Said
Feldshtein, Eugene ÉSchmidt, Jochen
Fernández Calvo, Ana IsabelSchmitt, Robert
Fiorelli, JulianoSchneider, Judith
Fischer, JoergScholz, Steffen
Flores Ituarte, IñigoSchroepfer, Dirk
Francalanza, EmmanuelSedmak, Aleksandar
Franklin, Aaron D.Serna, Sergio
Fydrych, DariuszShalaby, Mohamed
Galanis, NikolaosShao, Chenhui
Galinski, CezaryShimada, Keita
Garašić, IvicaShishkin, Andrei
García-Beltrán, ÁngelShutov, Alexey
Ghaffar, SeyedSilva, Francisco
Ghidelli, MatteoSilva, Francisco J. G.
Gong, HaijunSilva, M. Beatriz
Graf, MarcelSimões, Sónia
Guo, JiangSing, Swee Leong
Hannu, JariSniezek, Lucjan
Haque, RezwanulSperanzini, Emanuela
Hassui, AmauriSrivastava, Anil
Hayakawa, TohruStahl, Ullrich
He, WangpengStawarz, Marcin
He, YihaiStephenson, David A.
Hehr, AdamStojanović, Blaža
Hryniewicz, TadeuszSultan, Ibrahim
Hsiang, Hsing-ISun, Yongle
Hua Shi, YongSurace, Rossella
Iljkić, DarioSzostak, Marek
Jackson, Mark J.Szymczyk, Anna
James, SagilSzymczyk, Patrycja
Jasim, Ali A.Tabatabaei, Alireza
Jeong, Dae-YongTai, Bruce L.
Jin, Chul KyuTan, Caiwang
Kalinowski, KrzysztofTang, Kai
Kamiya, OsamuTang, Ming
Kan, ChiwaiTanner, David
Kang, JidongTexier, Damien
Karayiannis, NikosTomasz, Durejko
Kirilov, PlamenTomczak, Janusz
Kiryukhantsev-Korneev, Ph.V.Tomków, Jacek
Kiss, ImreTomota, Yo
Kono, DaisukeTosello, Guido
Konovalov, Sergey V.Trzepiecinski, Tomasz
Korosteleva, Elena N.Tsao, Chung Chen
Kotsiantis, SotirisTukhbatullin, Adis
Kovaleva, MarinaUddin, Mohammad
Krella, AlicjaVazquez Martinez, Juan Manuel
Krenický, TiborVázquez Valeo, Jesús
Królczyk, GrzegorzVelkavrh, Igor
Kumar, AnujVereshchaka, Alexey A.
Kunetsov, VladimirVolpp, Joerg
Kyratsis, PanagiotisWachowski, Marcin
Lai, GavinWang, A-Cheng
Laskowski, ŁukaszWang, Lei
Latypov, MaratWang, Tianhao
Lazarescu, LucianWang, Xiaoqing
Le, QichiWang, Xuan
Lee, Sang JinWei, Dongbin
Legutko, StanisławWen, Tong
Lei, ShutingWinczek, Jerzy
Lermen, Richard ThomasWiora, Józef
Li, ChongguiWojciechowski, Szymon
Li, SimonWong, Ka-Leung
Lin, Pai-ChenWu, Shengchuan
Lin, RichardXiao, Guijian
Liu, FengchaoXu, Weixing
Lorusso, MassimoXu, Zhiwu
Lu, XiaohongYan, Xueliang
Maeda, TomokiYang, Li
Maina, Martin RuthandiZhang, Junjie
Majerníková, JankaZhang, Lai-Chang
Mallik, Awadesh KumarZhang, Xueping
Marchese, GiulioZhang, Zhe
Markopoulos, AngelosZhao, Hong
Marmiroli, BenedettaZhao, Jianwen
Mei, XuesongZhao, Song
Menzemer, CraigZhou, Kun
Merrett, Craig G.Zhou, Le
Mikolajczyk, TadeuszZinovieva, Olga

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JMMP Editorial Office. Acknowledgement to Reviewers of JMMP in 2019. J. Manuf. Mater. Process. 2020, 4, 6. https://doi.org/10.3390/jmmp4010006

AMA Style

JMMP Editorial Office. Acknowledgement to Reviewers of JMMP in 2019. Journal of Manufacturing and Materials Processing. 2020; 4(1):6. https://doi.org/10.3390/jmmp4010006

Chicago/Turabian Style

JMMP Editorial Office. 2020. "Acknowledgement to Reviewers of JMMP in 2019" Journal of Manufacturing and Materials Processing 4, no. 1: 6. https://doi.org/10.3390/jmmp4010006

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