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Proceedings 2017, 1(4), 328; doi:10.3390/proceedings1040328

Fabrication Tolerance Sensitivity in Large-Area Mid-Infrared Metamaterial Absorbers

Electronic Instrumentation Laboratory, Department of Microelectronics, Faculty of EEMCS, Delft University of Technology, Delft, The Netherlands
Presented at the Eurosensors 2017 Conference, Paris, France, 3–6 September, 2017.
Author to whom correspondence should be addressed.
Published: 8 August 2017
(This article belongs to the Proceedings of Eurosensors 2017)
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Metamaterial absorbers are photonic structures composed of an array of sub-wavelength metallic patterns. Results in literature are usually based on structures of nominal dimensions, despite the significant effect of fabrication tolerances on performance. This research aims to identify the main sources of uncertainty and to investigate their effect, notably that of an irregular surface quality (i.e., roughness) of the thin metallic layer and the lithography related variations in size and shape. The effect of the shape and positioning of the resonance peak was investigated and validated using mid-infrared metamaterial absorbers. This sensitivity analysis is essential to the batch fabrication of metamaterial absorbers for MEMS applications.
Keywords: metamaterial absorber; mid-infrared; UV lithography; tolerance sensitivity; fabrication metamaterial absorber; mid-infrared; UV lithography; tolerance sensitivity; fabrication
This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited. (CC BY 4.0).

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MDPI and ACS Style

Ghaderi, M.; Karimi, E.; Ayerden, N.P.; Wolffenbuttel, R.F. Fabrication Tolerance Sensitivity in Large-Area Mid-Infrared Metamaterial Absorbers. Proceedings 2017, 1, 328.

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