Next Article in Journal
Graphene-Based Materials for Stem Cell Applications
Previous Article in Journal
High-Temperature Storage Testing of ACF Attached Sensor Structures
Article Menu

Export Article

Open AccessArticle
Materials 2015, 8(12), 8661-8673; doi:10.3390/ma8125484

A Photolithographic Approach to Polymeric Microneedles Array Fabrication

1
Institute for Microelectronics and Microsystems, National Council of Research, Via Pietro Castellino 111, Napoli 80131, Italy
2
IMAST Scarl, Piazza Bovio 22, Naples 80133, Italy
3
Department of Physics, University of Napoli “Federico II”, Via Cinthia, Napoli 80100, Italy
4
STMicroelectronics, via Remo De Feo 1, Arzano, Napoli 80022, Italy
*
Author to whom correspondence should be addressed.
Academic Editor: Juergen Stampfl
Received: 2 October 2015 / Revised: 2 December 2015 / Accepted: 3 December 2015 / Published: 11 December 2015
(This article belongs to the Section Manufacturing Processes and Systems)
View Full-Text   |   Download PDF [6037 KB, uploaded 11 December 2015]   |  

Abstract

In this work, two procedures for fabrication of polymeric microneedles based on direct photolithography, without any etching or molding process, are reported. Polyethylene glycol (average molecular weight 250 Da), casted into a silicone vessel and exposed to ultraviolet light (365 nm) through a mask, cross-links when added by a commercial photocatalyzer. By changing the position of the microneedles support with respect to the vessel, different shapes and lengths can be achieved. Microneedles from a hundred microns up to two millimeters have been obtained just tuning the radiation dose, by changing the exposure time (5–15 s) and/or the power density (9–18 mW/cm2) during photolithography. Different microneedle shapes, such as cylindrical, conic or lancet-like, for specific applications such as micro-indentation or drug delivery, are demonstrated. View Full-Text
Keywords: microneedles; photolithography; polymers microneedles; photolithography; polymers
This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited. (CC BY 4.0).

Scifeed alert for new publications

Never miss any articles matching your research from any publisher
  • Get alerts for new papers matching your research
  • Find out the new papers from selected authors
  • Updated daily for 49'000+ journals and 6000+ publishers
  • Define your Scifeed now

SciFeed Share & Cite This Article

MDPI and ACS Style

Dardano, P.; Caliò, A.; Di Palma, V.; Bevilacqua, M.F.; Di Matteo, A.; De Stefano, L. A Photolithographic Approach to Polymeric Microneedles Array Fabrication. Materials 2015, 8, 8661-8673.

Show more citation formats Show less citations formats

Related Articles

Article Metrics

Article Access Statistics

1

Comments

[Return to top]
Materials EISSN 1996-1944 Published by MDPI AG, Basel, Switzerland RSS E-Mail Table of Contents Alert
Back to Top