Optical Characterization of AsxTe100−x Films Grown by Plasma Deposition Based on the Advanced Optimizing Envelope Method
Abstract
:1. Introduction
2. Materials and Methods
2.1. An Alternative Approach for Computing k (λ)
2.2. Dual Transformation Regarding Tsm (λ) Taking into Account the Substrate Absorption
2.3. Calculation of a Lower Limit of n(λ)
3. Results
3.1. Measurements Regarding the Studied AsxTe100–X Films
3.2. Characterization of the As40Te60 Film on Sapphire Substrate by the AOEM
3.3. Characterization of the As98Te2 Film on Glass Substrate by the AOEM
3.4. Characterization of the As80Te20 Film on Glass Substrate Based on the AOEM
3.5. Additional Results about the AsxTe100−X Films
4. Discussion
5. Conclusions
Author Contributions
Funding
Conflicts of Interest
References
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As40Te60 Film, m1 Is Fixed, N = Ne = 22 | ||||
δd/N (nm) | m1 | ∆d (nm) | (nm) | FOM (k(Ti)) |
3.63 × 10−2 | 6 | 47 | 2676.5 | 0.0178 |
1.89 × 10−2 | 7 | 44 | 2994.7 | 0.00982 |
0.85 × 10−2 | 8 | 38 | 3349.2 | 0.00500 |
1.20 × 10−2 | 9 | 25 | 3748.3 | 0.00560 |
2.36 × 10−2 | 10 | 1 | 4114.8 | 0.01048 |
As98Te2 Film, m1 Is Fixed, N = Ne = 22 | ||||
δd/N (nm) | m1 | ∆d (nm) | (nm) | FOM (k(Ti)) |
4.50 | 2.5 | 40 | 1355.7 | 0.0461 |
2.13 | 3.5 | 32 | 1671.3 | 0.0210 |
0.520 | 4.5 | 23 | 1981.1 | 0.00512 |
2.59 | 5.5 | 0 | 2286.9 | 0.0188 |
6.29 | 6.5 | 0 | 2523.6 | 0.0447 |
As80Te20 Film, m1 Is Fixed, N = Ne = 46 | ||||
δd/N (nm) | m1 | ∆d (nm) | (nm) | FOM (k(Ti)) |
19.83 | 4.5 | 95 | 4945.4 | 0.02441 |
18.03 | 5.5 | 95 | 5425.2 | 0.02265 |
16.43 | 6.5 | 95 | 5808.8 | 0.01909 |
15.11 | 7.5 | 95 | 5947.2 | 0.01544 |
13.83 | 8.5 | 94 | 6496.4 | 0.01398 |
12.79 | 9.5 | 93 | 6914.5 | 0.01243 |
12.10 | 10.5 | 92 | 7325.7 | 0.01130 |
11.80 | 11.5 | 92 | 7847.5 | 0.01035 |
11.92 | 12.5 | 90 | 8302.6 | 0.00981 |
12.27 | 13.5 | 79 | 9064.3 | 0.00937 |
12.14 | 14.5 | 74 | 9586.0 | 0.00898 |
12.11 | 15.5 | 63 | 10,195 | 0.00892 |
12.07 | 16.5 | 45 | 10,916 | 0.00878 |
11.94 | 17.5 | 0 | 11,446 | 0.00859 |
12.10 | 18.5 | 0 | 11,867 | 0.00889 |
12.63 | 19.5 | 0 | 12,288 | 0.00931 |
Film | δd/N (nm) | p0 | FOM (k(T+)) | FOM (k(Ti)) | FOM (k0(λ)) | FOM (k0(λ) + Δk(λ)) |
---|---|---|---|---|---|---|
As40Te60 | 0.335 | 15 | 8.23 × 10−3 | 7.29 × 10−3 | 7.25 × 10−3 | 5.94 × 10−3 |
As98Te20 | 0.220 | 9 | 3.96 × 10−3 | 3.74 × 10−3 | 4.36 × 10−3 | 4.26 × 10−3 |
As80Te20, m1 = 11.5, ND | 6.89 | 6 | 1.57 × 10−2 | 1.04 × 10−2 | 1.16 × 10−2 | 1.23 × 10−2 |
As80Te20, m1 = 11.5, AD | 6.89 | 6 | 1.96 × 10−2 | 1.92 × 10−2 | 3.39 × 10−2 | 1.90 × 10−2 |
As80Te20, m1 = 17.5, AD | 11.94 | 7 | 1.04 × 10−2 | 8.59 × 10−3 | 9.42 × 10−3 | 8.23 × 10−3 |
Film, Specimen Number | From | m1 | N | δd/N (nm) | ||
---|---|---|---|---|---|---|
a-Si, 029 | [47] | 4 | 12 | 1.010 | 1172.0 | 1.034 |
a-Si, 074 | [47] | 4 | 14 | 1.349 | 1269.0 | 1.489 |
a-Si, 038 | [34] | 2 | 9 | 0.341 | 785.7 | 0.391 |
a-Si, 038 | [29] | 2 | 9 | 0.318 | 774.6 | 0.369 |
a-Si, 041 | [34] | 12 | 17 | 0.594 | 3939.1 | 0.256 |
a-Si, 041 | [29] | 12 | 17 | 0.567 | 3929.9 | 0.245 |
As33S67 | [48] | 2 | 9 | 0.706 | 744.8 | 0.853 |
As40Te60 | here | 8 | 11 | 0.335 | 3306.9 | 0.101 |
As98Te2 | here | 4.5 | 12 | 0.220 | 1983.8 | 0.133 |
As80Te20 | here | 17.5 | 46 | 11.94 | 11446 | 4.799 |
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Minkov, D.; Angelov, G.; Nestorov, R.; Nezhdanov, A.; Usanov, D.; Kudryashov, M.; Mashin, A. Optical Characterization of AsxTe100−x Films Grown by Plasma Deposition Based on the Advanced Optimizing Envelope Method. Materials 2020, 13, 2981. https://doi.org/10.3390/ma13132981
Minkov D, Angelov G, Nestorov R, Nezhdanov A, Usanov D, Kudryashov M, Mashin A. Optical Characterization of AsxTe100−x Films Grown by Plasma Deposition Based on the Advanced Optimizing Envelope Method. Materials. 2020; 13(13):2981. https://doi.org/10.3390/ma13132981
Chicago/Turabian StyleMinkov, Dorian, George Angelov, Radi Nestorov, Aleksey Nezhdanov, Dmitry Usanov, Mikhail Kudryashov, and Aleksandr Mashin. 2020. "Optical Characterization of AsxTe100−x Films Grown by Plasma Deposition Based on the Advanced Optimizing Envelope Method" Materials 13, no. 13: 2981. https://doi.org/10.3390/ma13132981