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Materials 2017, 10(2), 200; doi:10.3390/ma10020200

HRTEM Microstructural Characterization of β-WO3 Thin Films Deposited by Reactive RF Magnetron Sputtering

Materiales, Centro de Investigación en Materiales Avanzados Av. Miguel de Cervantes Saavedra 120, Complejo Industrial Chihuahua, Chihuahua 31136, Mexico
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Received: 11 January 2017 / Accepted: 9 February 2017 / Published: 17 February 2017
(This article belongs to the Section Structure Analysis and Characterization)
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Abstract

Though tungsten trioxide (WO3) in bulk, nanosphere, and thin film samples has been extensively studied, few studies have been dedicated to the crystallographic structure of WO3 thin films. In this work, the evolution from amorphous WO3 thin films to crystalline WO3 thin films is discussed. WO3 thin films were fabricated on silicon substrates (Si/SiO2) by RF reactive magnetron sputtering. Once a thin film was deposited, two successive annealing treatments were made: an initial annealing at 400 °C for 6 h was followed by a second annealing at 350 °C for 1 h. Film characterization was carried out by X-ray diffraction (XRD), high-resolution electron transmission microscopy (HRTEM), scanning electron microscopy (SEM), and atomic force microscopy (AFM) techniques. The β-WO3 final phase grew in form of columnar crystals and its growth plane was determined by HRTEM. View Full-Text
Keywords: β-WO3; thin films; HRTEM; microstructural β-WO3; thin films; HRTEM; microstructural
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This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited. (CC BY 4.0).

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MDPI and ACS Style

Faudoa-Arzate, A.; Arteaga-Durán, A.; Saenz-Hernández, R.; Botello-Zubiate, M.; Realyvazquez-Guevara, P.; Matutes-Aquino, J. HRTEM Microstructural Characterization of β-WO3 Thin Films Deposited by Reactive RF Magnetron Sputtering. Materials 2017, 10, 200.

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