*2.2. Structural and Morphological Characterization*

The film structure was investigated by grazing-incidence X-ray diffraction (GIXRD) employing a Siemens D5000 diffractometer equipped with parallel-beam optics and 0.4° Soller-slit collimator (Bruker AXS, Karlsruhe, Germany). The grazing angle was set to 0.5° and the diffractograms were collected with 5 s integration time and 0.05° resolution.

The film morphology was measured with scanning electron microscopy (SEM) using a FEI/Philips XL-30 environmental SEM microscope equipped with a field-emission gun (FEI, Hillsboro, OR, USA), and operated in Hi-Vac mode at 10 kV accelerating voltage.

The surface morphology was measured with atomic force microscopy (AFM) using a PSIA XE150 SPM/AFM (Park Systems Corp., Suwon, Korea) operating in non-contact mode in air at room temperature. Silicon ACTA cantilevers (AppNano, Mountain View, CA, USA) with 30 nm thick Al coating were used. The tip radius reported by the manufacturer was between 6 and 10 nm. Images were obtained at 1 Hz scanning rate over an area of 1000 nm × 1000 nm with a resolution of 256 pixels × 256 pixels.
