- Article
Layer Transfer from Chemically Etched 150 mm Porous Si Substrates
- Barbara Terheiden,
- Jan Hensen,
- Andreas Wolf,
- Renate Horbelt,
- Heiko Plagwitz and
- Rolf Brendel
We demonstrate for the first time the successful layer transfer of an epitaxially grown monocrystalline Si film from a purely chemically etched porous Si substrate of 150 mm diameter to a glass carrier. The surface conditioning for all Si layer trans...

